JPS52117547A - Electronic gun system - Google Patents
Electronic gun systemInfo
- Publication number
- JPS52117547A JPS52117547A JP3417876A JP3417876A JPS52117547A JP S52117547 A JPS52117547 A JP S52117547A JP 3417876 A JP3417876 A JP 3417876A JP 3417876 A JP3417876 A JP 3417876A JP S52117547 A JPS52117547 A JP S52117547A
- Authority
- JP
- Japan
- Prior art keywords
- gun system
- electronic gun
- electronic beam
- electronic
- speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To switch the current amount of electronic beam with the time speed of about blanking speed, the highest velocity among electronic beam exposure equipment.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3417876A JPS52117547A (en) | 1976-03-30 | 1976-03-30 | Electronic gun system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3417876A JPS52117547A (en) | 1976-03-30 | 1976-03-30 | Electronic gun system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS52117547A true JPS52117547A (en) | 1977-10-03 |
Family
ID=12406943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3417876A Pending JPS52117547A (en) | 1976-03-30 | 1976-03-30 | Electronic gun system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52117547A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004038508A1 (en) * | 2002-10-28 | 2004-05-06 | Matsushita Electric Industrial Co., Ltd. | Electron beam exposure method and electron beam exposure system |
-
1976
- 1976-03-30 JP JP3417876A patent/JPS52117547A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004038508A1 (en) * | 2002-10-28 | 2004-05-06 | Matsushita Electric Industrial Co., Ltd. | Electron beam exposure method and electron beam exposure system |
| US7176471B2 (en) | 2002-10-28 | 2007-02-13 | Matsushita Electric Industrial Co., Ltd. | Electron beam exposure method and electron beam exposure apparatus |
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