JPS52137984A - Drawing apparatus - Google Patents

Drawing apparatus

Info

Publication number
JPS52137984A
JPS52137984A JP5485776A JP5485776A JPS52137984A JP S52137984 A JPS52137984 A JP S52137984A JP 5485776 A JP5485776 A JP 5485776A JP 5485776 A JP5485776 A JP 5485776A JP S52137984 A JPS52137984 A JP S52137984A
Authority
JP
Japan
Prior art keywords
radiated
disturbance
wafer
development
data output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5485776A
Other languages
Japanese (ja)
Other versions
JPS5849019B2 (en
Inventor
Kuniyoshi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP51054857A priority Critical patent/JPS5849019B2/en
Publication of JPS52137984A publication Critical patent/JPS52137984A/en
Publication of JPS5849019B2 publication Critical patent/JPS5849019B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make easy checking of false positions possible despite error in patterns owing to disturbance at the time of drawing and even after development by comparing signal widths and phase differences between drawing data output signals and beam current signals obtainable from the wafer radiated thereto with a beam.
COPYRIGHT: (C)1977,JPO&Japio
JP51054857A 1976-05-14 1976-05-14 drawing device Expired JPS5849019B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51054857A JPS5849019B2 (en) 1976-05-14 1976-05-14 drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51054857A JPS5849019B2 (en) 1976-05-14 1976-05-14 drawing device

Publications (2)

Publication Number Publication Date
JPS52137984A true JPS52137984A (en) 1977-11-17
JPS5849019B2 JPS5849019B2 (en) 1983-11-01

Family

ID=12982251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51054857A Expired JPS5849019B2 (en) 1976-05-14 1976-05-14 drawing device

Country Status (1)

Country Link
JP (1) JPS5849019B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62162328A (en) * 1986-01-10 1987-07-18 Advantest Corp Charged particle beam exposure equipment
JP2006093455A (en) * 2004-09-24 2006-04-06 Toshiba Corp Pattern drawing apparatus, pattern inspection apparatus, and pattern drawing system
JP2011221555A (en) * 2011-07-22 2011-11-04 Toshiba Corp Pattern inspection device and pattern drawing system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62162328A (en) * 1986-01-10 1987-07-18 Advantest Corp Charged particle beam exposure equipment
JP2006093455A (en) * 2004-09-24 2006-04-06 Toshiba Corp Pattern drawing apparatus, pattern inspection apparatus, and pattern drawing system
JP2011221555A (en) * 2011-07-22 2011-11-04 Toshiba Corp Pattern inspection device and pattern drawing system

Also Published As

Publication number Publication date
JPS5849019B2 (en) 1983-11-01

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