JPS52138073A - Gas jetting apparatus - Google Patents

Gas jetting apparatus

Info

Publication number
JPS52138073A
JPS52138073A JP5500876A JP5500876A JPS52138073A JP S52138073 A JPS52138073 A JP S52138073A JP 5500876 A JP5500876 A JP 5500876A JP 5500876 A JP5500876 A JP 5500876A JP S52138073 A JPS52138073 A JP S52138073A
Authority
JP
Japan
Prior art keywords
gas flow
gas jetting
jetting apparatus
gas
controlling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5500876A
Other languages
Japanese (ja)
Other versions
JPS592536B2 (en
Inventor
Atsuo Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP51055008A priority Critical patent/JPS592536B2/en
Publication of JPS52138073A publication Critical patent/JPS52138073A/en
Publication of JPS592536B2 publication Critical patent/JPS592536B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To uniformly and effectively coat the purified reaction product on the object Substance, by controlling the induced gas flow with the gas shelter plate and the gas flow controlling the induced gas flow with the gas shelter plate and the gas flow controlling plate.
JP51055008A 1976-05-13 1976-05-13 gas injection device Expired JPS592536B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51055008A JPS592536B2 (en) 1976-05-13 1976-05-13 gas injection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51055008A JPS592536B2 (en) 1976-05-13 1976-05-13 gas injection device

Publications (2)

Publication Number Publication Date
JPS52138073A true JPS52138073A (en) 1977-11-17
JPS592536B2 JPS592536B2 (en) 1984-01-19

Family

ID=12986618

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51055008A Expired JPS592536B2 (en) 1976-05-13 1976-05-13 gas injection device

Country Status (1)

Country Link
JP (1) JPS592536B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63299325A (en) * 1987-05-29 1988-12-06 Sony Corp Vapor growth equipment
CN102277561A (en) * 2010-06-14 2011-12-14 硅绝缘体技术有限公司 System and method for a gas treatment of a number of substrates
CN103103499A (en) * 2011-11-11 2013-05-15 中国科学院沈阳科学仪器研制中心有限公司 Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6114943A (en) * 1984-06-29 1986-01-23 株式会社　リ−ダ− Laminated cover material for thermal sealing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63299325A (en) * 1987-05-29 1988-12-06 Sony Corp Vapor growth equipment
CN102277561A (en) * 2010-06-14 2011-12-14 硅绝缘体技术有限公司 System and method for a gas treatment of a number of substrates
CN103103499A (en) * 2011-11-11 2013-05-15 中国科学院沈阳科学仪器研制中心有限公司 Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus

Also Published As

Publication number Publication date
JPS592536B2 (en) 1984-01-19

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