JPS5217814A - Photoresist coating method - Google Patents

Photoresist coating method

Info

Publication number
JPS5217814A
JPS5217814A JP9239475A JP9239475A JPS5217814A JP S5217814 A JPS5217814 A JP S5217814A JP 9239475 A JP9239475 A JP 9239475A JP 9239475 A JP9239475 A JP 9239475A JP S5217814 A JPS5217814 A JP S5217814A
Authority
JP
Japan
Prior art keywords
coating method
photoresist coating
photoresist
coat
circumference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9239475A
Other languages
Japanese (ja)
Inventor
Masamichi Sato
Itsuo Fujii
Kazuhiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP9239475A priority Critical patent/JPS5217814A/en
Priority to DE19762634144 priority patent/DE2634144A1/en
Publication of JPS5217814A publication Critical patent/JPS5217814A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/74—Applying photosensitive compositions to the base; Drying processes therefor
    • G03C2001/7403—Air jets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To coat a photoresist in uniform thickness on a support by mechanically removing a coated film of a silver halide emulsion in its circumference.
JP9239475A 1975-07-29 1975-07-29 Photoresist coating method Pending JPS5217814A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9239475A JPS5217814A (en) 1975-07-29 1975-07-29 Photoresist coating method
DE19762634144 DE2634144A1 (en) 1975-07-29 1976-07-29 Coating film or plates with silver halide emulsion - partic. centrifugal coating with subsequent removal of thickened edge zone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9239475A JPS5217814A (en) 1975-07-29 1975-07-29 Photoresist coating method

Publications (1)

Publication Number Publication Date
JPS5217814A true JPS5217814A (en) 1977-02-10

Family

ID=14053192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9239475A Pending JPS5217814A (en) 1975-07-29 1975-07-29 Photoresist coating method

Country Status (1)

Country Link
JP (1) JPS5217814A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031255A (en) * 1983-07-29 1985-02-18 Rohm Co Ltd Method for flux deposition to semiconductor frame
WO2005084824A1 (en) * 2004-03-04 2005-09-15 Hoya Corporation Coating apparatus for optical lens
WO2005084825A1 (en) * 2004-03-04 2005-09-15 Hoya Corporation Coating apparatus and method of manufacturing optical lens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031255A (en) * 1983-07-29 1985-02-18 Rohm Co Ltd Method for flux deposition to semiconductor frame
WO2005084824A1 (en) * 2004-03-04 2005-09-15 Hoya Corporation Coating apparatus for optical lens
WO2005084825A1 (en) * 2004-03-04 2005-09-15 Hoya Corporation Coating apparatus and method of manufacturing optical lens
US7779778B2 (en) 2004-03-04 2010-08-24 Hoya Corporation Coating apparatus for optical lens

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