JPS5219531A - Method of producing positive photosensitive resin layer structure - Google Patents

Method of producing positive photosensitive resin layer structure

Info

Publication number
JPS5219531A
JPS5219531A JP51091228A JP9122876A JPS5219531A JP S5219531 A JPS5219531 A JP S5219531A JP 51091228 A JP51091228 A JP 51091228A JP 9122876 A JP9122876 A JP 9122876A JP S5219531 A JPS5219531 A JP S5219531A
Authority
JP
Japan
Prior art keywords
resin layer
layer structure
photosensitive resin
positive photosensitive
producing positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51091228A
Other languages
English (en)
Japanese (ja)
Inventor
Bindaa Yohan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of JPS5219531A publication Critical patent/JPS5219531A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP51091228A 1975-08-04 1976-07-30 Method of producing positive photosensitive resin layer structure Pending JPS5219531A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2534795A DE2534795C3 (de) 1975-08-04 1975-08-04 Verfahren zur Herstellung von Strukturen aus Positiv-Fotolackschichten

Publications (1)

Publication Number Publication Date
JPS5219531A true JPS5219531A (en) 1977-02-14

Family

ID=5953192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51091228A Pending JPS5219531A (en) 1975-08-04 1976-07-30 Method of producing positive photosensitive resin layer structure

Country Status (7)

Country Link
JP (1) JPS5219531A (fr)
BE (1) BE844743A (fr)
DE (1) DE2534795C3 (fr)
FR (1) FR2320584A1 (fr)
GB (1) GB1548017A (fr)
IT (1) IT1067163B (fr)
NL (1) NL7608635A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5090535A (fr) * 1973-12-12 1975-07-19
JPS6155649A (ja) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> パタン形成法
JPS6278550A (ja) * 1985-07-18 1987-04-10 マイクロシィ・インコーポレーテッド 放射感受性フイルムの現像法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU544060B2 (en) * 1980-07-28 1985-05-16 Polychrome Corp. Accelerated diazo sensitised
DE3216268A1 (de) * 1982-04-30 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zur verminderung von linienbreitenschwankungen bei der herstellung von aus fotolackschichten bestehenden strukturen auf fuer integrierte halbleiterschaltungen vorgesehenen substraten durch optische projektionsbelichtung
DE3310962A1 (de) * 1983-03-25 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zur reduzierung von linienbreitenschwankungen bei der herstellung von fotolackstrukturen
FR2618230A1 (fr) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Procede de photolithographie.
KR930008139B1 (en) * 1990-08-30 1993-08-26 Samsung Electronics Co Ltd Method for preparation of pattern
KR950008384B1 (ko) * 1992-12-10 1995-07-28 삼성전자주식회사 패턴의 형성방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5090535A (fr) * 1973-12-12 1975-07-19
JPS6155649A (ja) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> パタン形成法
JPS6278550A (ja) * 1985-07-18 1987-04-10 マイクロシィ・インコーポレーテッド 放射感受性フイルムの現像法

Also Published As

Publication number Publication date
BE844743A (fr) 1976-11-16
DE2534795C3 (de) 1978-05-24
NL7608635A (nl) 1977-02-08
DE2534795A1 (de) 1977-02-10
FR2320584A1 (fr) 1977-03-04
IT1067163B (it) 1985-03-12
FR2320584B1 (fr) 1979-09-28
DE2534795B2 (de) 1977-09-29
GB1548017A (en) 1979-07-04

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