JPS5223579A - Activation reaction evaporating apparatus - Google Patents

Activation reaction evaporating apparatus

Info

Publication number
JPS5223579A
JPS5223579A JP50099793A JP9979375A JPS5223579A JP S5223579 A JPS5223579 A JP S5223579A JP 50099793 A JP50099793 A JP 50099793A JP 9979375 A JP9979375 A JP 9979375A JP S5223579 A JPS5223579 A JP S5223579A
Authority
JP
Japan
Prior art keywords
activation reaction
evaporating apparatus
reaction evaporating
activation
reactive gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50099793A
Other languages
Japanese (ja)
Other versions
JPS5841351B2 (en
Inventor
Muneharu Komiya
Kazuyuki Tsuruoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP50099793A priority Critical patent/JPS5841351B2/en
Publication of JPS5223579A publication Critical patent/JPS5223579A/en
Publication of JPS5841351B2 publication Critical patent/JPS5841351B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:An activation reaction evaporating apparatus which efficiently performs ionization of metal vapors and electrolytic dissociation of reactive gas.
JP50099793A 1975-08-19 1975-08-19 Katsuseikahannoujiyouchiyakuuchi Expired JPS5841351B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50099793A JPS5841351B2 (en) 1975-08-19 1975-08-19 Katsuseikahannoujiyouchiyakuuchi

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50099793A JPS5841351B2 (en) 1975-08-19 1975-08-19 Katsuseikahannoujiyouchiyakuuchi

Publications (2)

Publication Number Publication Date
JPS5223579A true JPS5223579A (en) 1977-02-22
JPS5841351B2 JPS5841351B2 (en) 1983-09-12

Family

ID=14256787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50099793A Expired JPS5841351B2 (en) 1975-08-19 1975-08-19 Katsuseikahannoujiyouchiyakuuchi

Country Status (1)

Country Link
JP (1) JPS5841351B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53119283A (en) * 1977-03-29 1978-10-18 Ulvac Corp Activating evaporation apparatus
JPS56100669A (en) * 1980-01-14 1981-08-12 Koyo Jidoki Adhesive supplying device
JPS5842771A (en) * 1981-09-07 1983-03-12 Sumitomo Electric Ind Ltd Ion plating device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4860088A (en) * 1971-11-30 1973-08-23
JPS4952186A (en) * 1972-06-16 1974-05-21

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4860088A (en) * 1971-11-30 1973-08-23
JPS4952186A (en) * 1972-06-16 1974-05-21

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53119283A (en) * 1977-03-29 1978-10-18 Ulvac Corp Activating evaporation apparatus
JPS56100669A (en) * 1980-01-14 1981-08-12 Koyo Jidoki Adhesive supplying device
JPS5842771A (en) * 1981-09-07 1983-03-12 Sumitomo Electric Ind Ltd Ion plating device

Also Published As

Publication number Publication date
JPS5841351B2 (en) 1983-09-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees