JPS5225575A - Inspection method of the state of object - Google Patents

Inspection method of the state of object

Info

Publication number
JPS5225575A
JPS5225575A JP10120875A JP10120875A JPS5225575A JP S5225575 A JPS5225575 A JP S5225575A JP 10120875 A JP10120875 A JP 10120875A JP 10120875 A JP10120875 A JP 10120875A JP S5225575 A JPS5225575 A JP S5225575A
Authority
JP
Japan
Prior art keywords
state
inspection method
inspection
masks
correcting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10120875A
Other languages
Japanese (ja)
Other versions
JPS6043657B2 (en
Inventor
Hiroyuki Ibe
Kiyoshi Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50101208A priority Critical patent/JPS6043657B2/en
Publication of JPS5225575A publication Critical patent/JPS5225575A/en
Publication of JPS6043657B2 publication Critical patent/JPS6043657B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make the inspection of the state of defects of an object plane without the position slide possible, by means of always detecting and correcting the outside appearance of two photo-masks with the identical pattern.
COPYRIGHT: (C)1977,JPO&Japio
JP50101208A 1975-08-22 1975-08-22 Object condition inspection method Expired JPS6043657B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50101208A JPS6043657B2 (en) 1975-08-22 1975-08-22 Object condition inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50101208A JPS6043657B2 (en) 1975-08-22 1975-08-22 Object condition inspection method

Publications (2)

Publication Number Publication Date
JPS5225575A true JPS5225575A (en) 1977-02-25
JPS6043657B2 JPS6043657B2 (en) 1985-09-30

Family

ID=14294493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50101208A Expired JPS6043657B2 (en) 1975-08-22 1975-08-22 Object condition inspection method

Country Status (1)

Country Link
JP (1) JPS6043657B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542074A (en) * 1977-06-07 1979-01-09 Canon Inc Alignment unit
JPS54111774A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Inspection method of mask and its unit
JPS5648631A (en) * 1979-09-28 1981-05-01 Hitachi Ltd Photomask inspecting apparatus
JPS57194304A (en) * 1981-05-27 1982-11-29 Hitachi Ltd Inspecting method for circuit pattern
JPS5821111A (en) * 1981-07-29 1983-02-07 Nippon Kogaku Kk <Nikon> Positioning device for pattern detection
JPS5860538A (en) * 1981-10-06 1983-04-11 Fujitsu Ltd Inspecting method for rattern
JPS5987607U (en) * 1982-12-03 1984-06-13 日立電子エンジニアリング株式会社 Alignment device for mutual comparison pattern inspection machine
JPS59132129A (en) * 1983-01-19 1984-07-30 Hitachi Ltd Inspection device for defect
JPS59157505A (en) * 1983-02-28 1984-09-06 Hitachi Ltd Pattern inspecting device
JPS59171808A (en) * 1983-03-18 1984-09-28 Takaharu Miyazaki Comparing and determining method for luminance signal
JPS62171767U (en) * 1986-03-19 1987-10-31

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542074A (en) * 1977-06-07 1979-01-09 Canon Inc Alignment unit
JPS54111774A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Inspection method of mask and its unit
JPS5648631A (en) * 1979-09-28 1981-05-01 Hitachi Ltd Photomask inspecting apparatus
JPS57194304A (en) * 1981-05-27 1982-11-29 Hitachi Ltd Inspecting method for circuit pattern
JPS5821111A (en) * 1981-07-29 1983-02-07 Nippon Kogaku Kk <Nikon> Positioning device for pattern detection
JPS5860538A (en) * 1981-10-06 1983-04-11 Fujitsu Ltd Inspecting method for rattern
JPS5987607U (en) * 1982-12-03 1984-06-13 日立電子エンジニアリング株式会社 Alignment device for mutual comparison pattern inspection machine
JPS59132129A (en) * 1983-01-19 1984-07-30 Hitachi Ltd Inspection device for defect
JPS59157505A (en) * 1983-02-28 1984-09-06 Hitachi Ltd Pattern inspecting device
JPS59171808A (en) * 1983-03-18 1984-09-28 Takaharu Miyazaki Comparing and determining method for luminance signal
JPS62171767U (en) * 1986-03-19 1987-10-31

Also Published As

Publication number Publication date
JPS6043657B2 (en) 1985-09-30

Similar Documents

Publication Publication Date Title
CA1006820A (en) Inspection port for turbines
JPS5371563A (en) Automatic inspection correcting method for mask
JPS5225575A (en) Inspection method of the state of object
JPS51126894A (en) Voltammetry apparatus
JPS5218170A (en) Position detection method
JPS51139353A (en) Apparatus of measuring the positions and widths simultaneously
JPS5222479A (en) Method of inspecting masks
NO144321C (en) GAS ABSORPTION APPARATUS.
JPS5232676A (en) Pattern check system
JPS5227280A (en) Method to form pinholes
JPS51136437A (en) A process for inspecting signal quality
JPS51131002A (en) Car inspection and examination device
JPS5242074A (en) Detecting method of position
JPS51149332A (en) An automatic marking apparatus
JPS5222473A (en) Panel measuring device
JPS51147152A (en) Pattern angle detector
JPS5231674A (en) Defects pattern detection system
JPS527565A (en) Method of and apparatus for stopping object at fixed position
JPS5432231A (en) Detection system of pattern defect
JPS523472A (en) Automatic range changing apparatus
JPS5232271A (en) Inspection method and equipment for photomask pattern
JPS5279877A (en) Mask inspection device
JPS51127752A (en) Seam detecting method
JPS51113665A (en) Method and apparatus of the selection of goods for testing
JPS51120747A (en) Device for inspecting line symmetrical patterns