JPS5227075A - Evaporation rate controlling apparatus - Google Patents

Evaporation rate controlling apparatus

Info

Publication number
JPS5227075A
JPS5227075A JP10300575A JP10300575A JPS5227075A JP S5227075 A JPS5227075 A JP S5227075A JP 10300575 A JP10300575 A JP 10300575A JP 10300575 A JP10300575 A JP 10300575A JP S5227075 A JPS5227075 A JP S5227075A
Authority
JP
Japan
Prior art keywords
rate controlling
evaporation rate
controlling apparatus
evaporation
rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10300575A
Other languages
Japanese (ja)
Inventor
Yoshinobu Taruya
Takehiko Watanabe
Sanehiro Kudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10300575A priority Critical patent/JPS5227075A/en
Publication of JPS5227075A publication Critical patent/JPS5227075A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:In evaporation method by electron beam gun, an evaporation rate controlling system effective for making the rate of evaporation constant by response to ctnrol signal voltage at higher speed than emission current.
JP10300575A 1975-08-27 1975-08-27 Evaporation rate controlling apparatus Pending JPS5227075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10300575A JPS5227075A (en) 1975-08-27 1975-08-27 Evaporation rate controlling apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10300575A JPS5227075A (en) 1975-08-27 1975-08-27 Evaporation rate controlling apparatus

Publications (1)

Publication Number Publication Date
JPS5227075A true JPS5227075A (en) 1977-03-01

Family

ID=14342534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10300575A Pending JPS5227075A (en) 1975-08-27 1975-08-27 Evaporation rate controlling apparatus

Country Status (1)

Country Link
JP (1) JPS5227075A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61202662A (en) * 1985-03-04 1986-09-08 Nisshin Flour Milling Co Ltd Floating feed for raising fish
JPS624863A (en) * 1985-06-29 1987-01-10 Anelva Corp Device for controlling distribution of vaporization rate of electron gun
JPH029349A (en) * 1988-06-28 1990-01-12 Oriental Yeast Co Ltd Feed for sweetfish

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61202662A (en) * 1985-03-04 1986-09-08 Nisshin Flour Milling Co Ltd Floating feed for raising fish
JPS624863A (en) * 1985-06-29 1987-01-10 Anelva Corp Device for controlling distribution of vaporization rate of electron gun
JPH029349A (en) * 1988-06-28 1990-01-12 Oriental Yeast Co Ltd Feed for sweetfish

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