JPS5227351A - Wafer process control system - Google Patents
Wafer process control systemInfo
- Publication number
- JPS5227351A JPS5227351A JP10297075A JP10297075A JPS5227351A JP S5227351 A JPS5227351 A JP S5227351A JP 10297075 A JP10297075 A JP 10297075A JP 10297075 A JP10297075 A JP 10297075A JP S5227351 A JPS5227351 A JP S5227351A
- Authority
- JP
- Japan
- Prior art keywords
- control system
- process control
- wafer process
- wafer
- processing control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004886 process control Methods 0.000 title 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: An accurate and effective wafer processing control can be ensured by utilizing dummy wafer which contains marks or characters necessary for the processing control and also can be stored into a magazine as the real wafer.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10297075A JPS5227351A (en) | 1975-08-27 | 1975-08-27 | Wafer process control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10297075A JPS5227351A (en) | 1975-08-27 | 1975-08-27 | Wafer process control system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5227351A true JPS5227351A (en) | 1977-03-01 |
Family
ID=14341612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10297075A Pending JPS5227351A (en) | 1975-08-27 | 1975-08-27 | Wafer process control system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5227351A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434777A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Mask aligner |
| JPS55115325A (en) * | 1979-02-28 | 1980-09-05 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Numbering method of semiconductor wafer |
| JPS5951657U (en) * | 1982-09-30 | 1984-04-05 | 日本電気ホームエレクトロニクス株式会社 | Shock absorber |
| JPS6120310A (en) * | 1984-07-07 | 1986-01-29 | Wacom Co Ltd | Cylindrical coil and manufacture thereof |
| JP2001148334A (en) * | 1999-11-22 | 2001-05-29 | Nikko Materials Co Ltd | Dummy wafer |
-
1975
- 1975-08-27 JP JP10297075A patent/JPS5227351A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434777A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Mask aligner |
| JPS55115325A (en) * | 1979-02-28 | 1980-09-05 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Numbering method of semiconductor wafer |
| JPS5951657U (en) * | 1982-09-30 | 1984-04-05 | 日本電気ホームエレクトロニクス株式会社 | Shock absorber |
| JPS6120310A (en) * | 1984-07-07 | 1986-01-29 | Wacom Co Ltd | Cylindrical coil and manufacture thereof |
| JP2001148334A (en) * | 1999-11-22 | 2001-05-29 | Nikko Materials Co Ltd | Dummy wafer |
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