JPS5241052B2 - - Google Patents
Info
- Publication number
- JPS5241052B2 JPS5241052B2 JP49109194A JP10919474A JPS5241052B2 JP S5241052 B2 JPS5241052 B2 JP S5241052B2 JP 49109194 A JP49109194 A JP 49109194A JP 10919474 A JP10919474 A JP 10919474A JP S5241052 B2 JPS5241052 B2 JP S5241052B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49109194A JPS5136129A (en) | 1974-09-20 | 1974-09-20 | Kankoseisoseibutsu |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49109194A JPS5136129A (en) | 1974-09-20 | 1974-09-20 | Kankoseisoseibutsu |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5136129A JPS5136129A (en) | 1976-03-26 |
| JPS5241052B2 true JPS5241052B2 (fr) | 1977-10-15 |
Family
ID=14503998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49109194A Granted JPS5136129A (en) | 1974-09-20 | 1974-09-20 | Kankoseisoseibutsu |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5136129A (fr) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4822719A (en) * | 1985-08-13 | 1989-04-18 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture, radiation-sensitive recording material containing said mixture, and process for preparing relief images |
| JP2007033518A (ja) * | 2005-07-22 | 2007-02-08 | Showa Highpolymer Co Ltd | 感光性樹脂組成物 |
| JP2007033517A (ja) * | 2005-07-22 | 2007-02-08 | Showa Highpolymer Co Ltd | 感光性の樹脂組成物 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52150619A (en) * | 1976-06-10 | 1977-12-14 | Toray Industries | Photosensitive resin composition |
| JP2549366B2 (ja) * | 1986-10-03 | 1996-10-30 | 三菱化学株式会社 | 感光性平版印刷版 |
| DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE4002397A1 (de) * | 1990-01-27 | 1991-08-01 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE4003025A1 (de) * | 1990-02-02 | 1991-08-08 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
| DE19803564A1 (de) | 1998-01-30 | 1999-08-05 | Agfa Gevaert Ag | Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen |
-
1974
- 1974-09-20 JP JP49109194A patent/JPS5136129A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4822719A (en) * | 1985-08-13 | 1989-04-18 | Hoechst Aktiengesellschaft | Radiation-sensitive mixture, radiation-sensitive recording material containing said mixture, and process for preparing relief images |
| JP2007033518A (ja) * | 2005-07-22 | 2007-02-08 | Showa Highpolymer Co Ltd | 感光性樹脂組成物 |
| JP2007033517A (ja) * | 2005-07-22 | 2007-02-08 | Showa Highpolymer Co Ltd | 感光性の樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5136129A (en) | 1976-03-26 |