JPS5243376A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5243376A JPS5243376A JP50118637A JP11863775A JPS5243376A JP S5243376 A JPS5243376 A JP S5243376A JP 50118637 A JP50118637 A JP 50118637A JP 11863775 A JP11863775 A JP 11863775A JP S5243376 A JPS5243376 A JP S5243376A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- high concentration
- layer
- duffusion
- latch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50118637A JPS5243376A (en) | 1975-10-01 | 1975-10-01 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50118637A JPS5243376A (en) | 1975-10-01 | 1975-10-01 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5243376A true JPS5243376A (en) | 1977-04-05 |
Family
ID=14741454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50118637A Pending JPS5243376A (en) | 1975-10-01 | 1975-10-01 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5243376A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157557A (en) * | 1981-03-23 | 1982-09-29 | Fujitsu Ltd | Complementary mis integrated circuit |
| EP0767497A1 (en) * | 1995-10-04 | 1997-04-09 | Nec Corporation | A semiconductor device having pull-up or pull-down resistance |
-
1975
- 1975-10-01 JP JP50118637A patent/JPS5243376A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57157557A (en) * | 1981-03-23 | 1982-09-29 | Fujitsu Ltd | Complementary mis integrated circuit |
| EP0767497A1 (en) * | 1995-10-04 | 1997-04-09 | Nec Corporation | A semiconductor device having pull-up or pull-down resistance |
| US5760447A (en) * | 1995-10-04 | 1998-06-02 | Nec Corporation | Semiconductor device having pull-up or pull-down resistance |
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