JPS5244155A - Microwave ion source for paper-strip type beam - Google Patents

Microwave ion source for paper-strip type beam

Info

Publication number
JPS5244155A
JPS5244155A JP50119738A JP11973875A JPS5244155A JP S5244155 A JPS5244155 A JP S5244155A JP 50119738 A JP50119738 A JP 50119738A JP 11973875 A JP11973875 A JP 11973875A JP S5244155 A JPS5244155 A JP S5244155A
Authority
JP
Japan
Prior art keywords
ion source
paper
microwave ion
type beam
strip type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50119738A
Other languages
Japanese (ja)
Other versions
JPS5836455B2 (en
Inventor
Hideki Koike
Kuniyuki Sakumichi
Katsumi Tokikuchi
Ichiro Shikamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50119738A priority Critical patent/JPS5836455B2/en
Publication of JPS5244155A publication Critical patent/JPS5244155A/en
Publication of JPS5836455B2 publication Critical patent/JPS5836455B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE: As for the structure of the discharge room of microwave ion source, the portion except ridge-type electrode is made into a column shape. As a result, a simple structure as well as improved cooling effect can be ensured.
COPYRIGHT: (C)1977,JPO&Japio
JP50119738A 1975-10-06 1975-10-06 tanzak bee microhyeongen Expired JPS5836455B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50119738A JPS5836455B2 (en) 1975-10-06 1975-10-06 tanzak bee microhyeongen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50119738A JPS5836455B2 (en) 1975-10-06 1975-10-06 tanzak bee microhyeongen

Publications (2)

Publication Number Publication Date
JPS5244155A true JPS5244155A (en) 1977-04-06
JPS5836455B2 JPS5836455B2 (en) 1983-08-09

Family

ID=14768893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50119738A Expired JPS5836455B2 (en) 1975-10-06 1975-10-06 tanzak bee microhyeongen

Country Status (1)

Country Link
JP (1) JPS5836455B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5658541A (en) * 1979-10-05 1981-05-21 Personal Products Co Flexible absorbing board
JPS5836300A (en) * 1981-08-03 1983-03-03 パ−ソナル・プロダクツ・カンパニ− Stable absorbing board
JPS63147459A (en) * 1986-12-11 1988-06-20 昭和電工株式会社 Absorbing body
US5569231A (en) * 1994-03-01 1996-10-29 The Procter & Gamble Company Trisection sanitary napkin
US6927148B2 (en) 2002-07-15 2005-08-09 Applied Materials, Inc. Ion implantation method and method for manufacturing SOI wafer
US7064049B2 (en) 2002-07-31 2006-06-20 Applied Materials, Inv. Ion implantation method, SOI wafer manufacturing method and ion implantation system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5658541A (en) * 1979-10-05 1981-05-21 Personal Products Co Flexible absorbing board
JPS5836300A (en) * 1981-08-03 1983-03-03 パ−ソナル・プロダクツ・カンパニ− Stable absorbing board
JPS63147459A (en) * 1986-12-11 1988-06-20 昭和電工株式会社 Absorbing body
US5569231A (en) * 1994-03-01 1996-10-29 The Procter & Gamble Company Trisection sanitary napkin
US6927148B2 (en) 2002-07-15 2005-08-09 Applied Materials, Inc. Ion implantation method and method for manufacturing SOI wafer
US7064049B2 (en) 2002-07-31 2006-06-20 Applied Materials, Inv. Ion implantation method, SOI wafer manufacturing method and ion implantation system

Also Published As

Publication number Publication date
JPS5836455B2 (en) 1983-08-09

Similar Documents

Publication Publication Date Title
JPS5244155A (en) Microwave ion source for paper-strip type beam
JPS5231653A (en) Production of hexaboride cathode
JPS5246300A (en) Ionic source
JPS5252099A (en) Plasma ion source
JPS51115764A (en) Manufacturing method of a magnetron
JPS5230277A (en) Fluorescent substance for low speed electron beam
JPS5245180A (en) Method of manufacture of electric bulb
JPS51151062A (en) Electron tube
JPS5238788A (en) Manufacturing method of vaporized metal discharge lamp
JPS5226013A (en) Compound tube
JPS537683A (en) Purification of pyridoxine
JPS51136886A (en) New biologica lly active substance, ml-236c, and its preparation
JPS51134554A (en) Getter material
JPS5239360A (en) Magnetron
JPS51151060A (en) Construction method of a magnetron anode constituted body
JPS5376739A (en) Manufacture of cathode-ray tube
JPS51112789A (en) Ozonizer
JPS5220391A (en) Process for fabricating a fibrous material containing ion exchangers
JPS51141304A (en) Method to manufacture a winding
JPS51141998A (en) Multiple coaxial micro wave ion source
JPS51132500A (en) High dielectric composed substance
JPS53131893A (en) Ion source
JPS5254900A (en) Ion source for microwave
JPS52127167A (en) Etching method
JPS51139765A (en) Method of manufacturing secondary electron multiplication channel plate