JPS5251931A - Novel positive type photoresist composition - Google Patents

Novel positive type photoresist composition

Info

Publication number
JPS5251931A
JPS5251931A JP12801075A JP12801075A JPS5251931A JP S5251931 A JPS5251931 A JP S5251931A JP 12801075 A JP12801075 A JP 12801075A JP 12801075 A JP12801075 A JP 12801075A JP S5251931 A JPS5251931 A JP S5251931A
Authority
JP
Japan
Prior art keywords
photoresist composition
positive type
type photoresist
novel positive
novel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12801075A
Other languages
Japanese (ja)
Other versions
JPS562333B2 (en
Inventor
Takashi Komine
Akira Yokota
Shingo Asaumi
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP12801075A priority Critical patent/JPS5251931A/en
Publication of JPS5251931A publication Critical patent/JPS5251931A/en
Publication of JPS562333B2 publication Critical patent/JPS562333B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To improve sensitivity and stability and prevent deterioration of adhesion and resolution, by mixing a specified naphthoquinone-diazido-sufonic acid ester with an alkali-soluble phenolic resin.
JP12801075A 1975-10-24 1975-10-24 Novel positive type photoresist composition Granted JPS5251931A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12801075A JPS5251931A (en) 1975-10-24 1975-10-24 Novel positive type photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12801075A JPS5251931A (en) 1975-10-24 1975-10-24 Novel positive type photoresist composition

Publications (2)

Publication Number Publication Date
JPS5251931A true JPS5251931A (en) 1977-04-26
JPS562333B2 JPS562333B2 (en) 1981-01-19

Family

ID=14974231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12801075A Granted JPS5251931A (en) 1975-10-24 1975-10-24 Novel positive type photoresist composition

Country Status (1)

Country Link
JP (1) JPS5251931A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57111530A (en) * 1980-10-24 1982-07-12 Hoechst Ag Photosensitive mixture and photosensitive copying material manufactured from said mixture
JPS62191848A (en) * 1986-02-17 1987-08-22 Nec Corp Positive resist material

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6056401U (en) * 1983-09-24 1985-04-19 株式会社　大隈鉄工所 machine tool headstock

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57111530A (en) * 1980-10-24 1982-07-12 Hoechst Ag Photosensitive mixture and photosensitive copying material manufactured from said mixture
JPS62191848A (en) * 1986-02-17 1987-08-22 Nec Corp Positive resist material

Also Published As

Publication number Publication date
JPS562333B2 (en) 1981-01-19

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