JPS5260074A - Charge particle beam apparatus - Google Patents
Charge particle beam apparatusInfo
- Publication number
- JPS5260074A JPS5260074A JP50135999A JP13599975A JPS5260074A JP S5260074 A JPS5260074 A JP S5260074A JP 50135999 A JP50135999 A JP 50135999A JP 13599975 A JP13599975 A JP 13599975A JP S5260074 A JPS5260074 A JP S5260074A
- Authority
- JP
- Japan
- Prior art keywords
- charge particle
- particle beam
- beam apparatus
- particle apparatus
- devices
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To make possible highly accurate aligning in production of ultra LSIs by providing two pieces of optical length measuring devices in X direction or Y direction to a charge particle apparatus and detectiing and compensating the rotation accompanied with the mechanical movement of the stage with these devices, in the charge particle apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50135999A JPS5260074A (en) | 1975-11-12 | 1975-11-12 | Charge particle beam apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50135999A JPS5260074A (en) | 1975-11-12 | 1975-11-12 | Charge particle beam apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5260074A true JPS5260074A (en) | 1977-05-18 |
Family
ID=15164817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50135999A Pending JPS5260074A (en) | 1975-11-12 | 1975-11-12 | Charge particle beam apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5260074A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461563U (en) * | 1977-10-11 | 1979-04-28 | ||
| JPS6458442A (en) * | 1987-08-31 | 1989-03-06 | Toshiba Corp | Correction of yawing of xy-stage |
| JPH06501590A (en) * | 1990-07-23 | 1994-02-17 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | High precision, high flexibility energy beam processing system |
-
1975
- 1975-11-12 JP JP50135999A patent/JPS5260074A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461563U (en) * | 1977-10-11 | 1979-04-28 | ||
| JPS6458442A (en) * | 1987-08-31 | 1989-03-06 | Toshiba Corp | Correction of yawing of xy-stage |
| JPH06501590A (en) * | 1990-07-23 | 1994-02-17 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | High precision, high flexibility energy beam processing system |
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