JPS5280779A - Production of simiconductor device - Google Patents

Production of simiconductor device

Info

Publication number
JPS5280779A
JPS5280779A JP15746575A JP15746575A JPS5280779A JP S5280779 A JPS5280779 A JP S5280779A JP 15746575 A JP15746575 A JP 15746575A JP 15746575 A JP15746575 A JP 15746575A JP S5280779 A JPS5280779 A JP S5280779A
Authority
JP
Japan
Prior art keywords
production
simiconductor
simiconductor device
soften
relax
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15746575A
Other languages
Japanese (ja)
Other versions
JPS5756770B2 (en
Inventor
Yoshiki Tanigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15746575A priority Critical patent/JPS5280779A/en
Publication of JPS5280779A publication Critical patent/JPS5280779A/en
Publication of JPS5756770B2 publication Critical patent/JPS5756770B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To prevent disconnection by irradiating phosphosilicate glass with infrared rays of a wavelength of 9 - 10μm to heat and thereby soften it so as to relax difference in level.
COPYRIGHT: (C)1977,JPO&Japio
JP15746575A 1975-12-27 1975-12-27 Production of simiconductor device Granted JPS5280779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15746575A JPS5280779A (en) 1975-12-27 1975-12-27 Production of simiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15746575A JPS5280779A (en) 1975-12-27 1975-12-27 Production of simiconductor device

Publications (2)

Publication Number Publication Date
JPS5280779A true JPS5280779A (en) 1977-07-06
JPS5756770B2 JPS5756770B2 (en) 1982-12-01

Family

ID=15650251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15746575A Granted JPS5280779A (en) 1975-12-27 1975-12-27 Production of simiconductor device

Country Status (1)

Country Link
JP (1) JPS5280779A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56500912A (en) * 1979-07-24 1981-07-02
JPS56116687U (en) * 1980-02-06 1981-09-07
JPS56167334A (en) * 1980-04-28 1981-12-23 Fairchild Camera Instr Co Method of heating material with sio2 as base
JPS5731144A (en) * 1980-07-31 1982-02-19 Fujitsu Ltd Mamufacture of semiconductor device
JPS5769748A (en) * 1980-10-17 1982-04-28 Fujitsu Ltd Manufacture of semiconductor device
JPS57162447A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Manufacture of semiconductor device
JPS5844746A (en) * 1981-09-10 1983-03-15 Seiko Epson Corp Semiconductor device and its manufacturing method
JPS5944846A (en) * 1982-09-07 1984-03-13 Fujitsu Ltd Manufacture of semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097777U (en) * 1983-12-08 1985-07-03 帝人製機株式会社 Melt spinning equipment

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56500912A (en) * 1979-07-24 1981-07-02
JPS56116687U (en) * 1980-02-06 1981-09-07
JPS56167334A (en) * 1980-04-28 1981-12-23 Fairchild Camera Instr Co Method of heating material with sio2 as base
JPS5731144A (en) * 1980-07-31 1982-02-19 Fujitsu Ltd Mamufacture of semiconductor device
JPS5769748A (en) * 1980-10-17 1982-04-28 Fujitsu Ltd Manufacture of semiconductor device
JPS57162447A (en) * 1981-03-31 1982-10-06 Fujitsu Ltd Manufacture of semiconductor device
JPS5844746A (en) * 1981-09-10 1983-03-15 Seiko Epson Corp Semiconductor device and its manufacturing method
JPS5944846A (en) * 1982-09-07 1984-03-13 Fujitsu Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5756770B2 (en) 1982-12-01

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