JPS5291651A - Alignment for exposure mask - Google Patents
Alignment for exposure maskInfo
- Publication number
- JPS5291651A JPS5291651A JP813476A JP813476A JPS5291651A JP S5291651 A JPS5291651 A JP S5291651A JP 813476 A JP813476 A JP 813476A JP 813476 A JP813476 A JP 813476A JP S5291651 A JPS5291651 A JP S5291651A
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- exposure mask
- mask
- clearer
- profile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To perform mask alignment at a high accuracy by applying light from the rear surface of a transparent wafer and observing transmission light therethrough to make the profile of a mask clearer.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP813476A JPS5291651A (en) | 1976-01-28 | 1976-01-28 | Alignment for exposure mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP813476A JPS5291651A (en) | 1976-01-28 | 1976-01-28 | Alignment for exposure mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5291651A true JPS5291651A (en) | 1977-08-02 |
Family
ID=11684807
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP813476A Pending JPS5291651A (en) | 1976-01-28 | 1976-01-28 | Alignment for exposure mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5291651A (en) |
-
1976
- 1976-01-28 JP JP813476A patent/JPS5291651A/en active Pending
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