JPS5293493A - Preparation of macromolecular materials for electron beam resists - Google Patents

Preparation of macromolecular materials for electron beam resists

Info

Publication number
JPS5293493A
JPS5293493A JP1012976A JP1012976A JPS5293493A JP S5293493 A JPS5293493 A JP S5293493A JP 1012976 A JP1012976 A JP 1012976A JP 1012976 A JP1012976 A JP 1012976A JP S5293493 A JPS5293493 A JP S5293493A
Authority
JP
Japan
Prior art keywords
electron beam
macromolecular materials
preparation
beam resists
resists
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1012976A
Other languages
Japanese (ja)
Other versions
JPS5340634B2 (en
Inventor
Norinaga Fujishige
Susumu Ichikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP1012976A priority Critical patent/JPS5293493A/en
Publication of JPS5293493A publication Critical patent/JPS5293493A/en
Publication of JPS5340634B2 publication Critical patent/JPS5340634B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To prepare macromolecular materials for the positive-type electron beam resists, without forming pin-holes, improved in the degree of development, obtained by eliminating the low molecular weight component as much as possible from the alkyl methacrylate polymers or copolymers with a wide molecular-weight distribution.
COPYRIGHT: (C)1977,JPO&Japio
JP1012976A 1976-02-02 1976-02-02 Preparation of macromolecular materials for electron beam resists Granted JPS5293493A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1012976A JPS5293493A (en) 1976-02-02 1976-02-02 Preparation of macromolecular materials for electron beam resists

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1012976A JPS5293493A (en) 1976-02-02 1976-02-02 Preparation of macromolecular materials for electron beam resists

Publications (2)

Publication Number Publication Date
JPS5293493A true JPS5293493A (en) 1977-08-05
JPS5340634B2 JPS5340634B2 (en) 1978-10-28

Family

ID=11741665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1012976A Granted JPS5293493A (en) 1976-02-02 1976-02-02 Preparation of macromolecular materials for electron beam resists

Country Status (1)

Country Link
JP (1) JPS5293493A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55105244A (en) * 1979-02-06 1980-08-12 Victor Co Of Japan Ltd Electron beam resist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55105244A (en) * 1979-02-06 1980-08-12 Victor Co Of Japan Ltd Electron beam resist

Also Published As

Publication number Publication date
JPS5340634B2 (en) 1978-10-28

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