JPS5295967A - Wafer washing and drying unit - Google Patents

Wafer washing and drying unit

Info

Publication number
JPS5295967A
JPS5295967A JP1227376A JP1227376A JPS5295967A JP S5295967 A JPS5295967 A JP S5295967A JP 1227376 A JP1227376 A JP 1227376A JP 1227376 A JP1227376 A JP 1227376A JP S5295967 A JPS5295967 A JP S5295967A
Authority
JP
Japan
Prior art keywords
drying unit
wafer washing
cylinder
wafer
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1227376A
Other languages
Japanese (ja)
Inventor
Shogo Kiyota
Tetsuya Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1227376A priority Critical patent/JPS5295967A/en
Publication of JPS5295967A publication Critical patent/JPS5295967A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To wash and dry wafer clearly by deflating forcedly the air within the cylinder in use of the jetted gas between the inside wall of vessel and the persienne cylinder surrounding the wafers storage area.
COPYRIGHT: (C)1977,JPO&Japio
JP1227376A 1976-02-09 1976-02-09 Wafer washing and drying unit Pending JPS5295967A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1227376A JPS5295967A (en) 1976-02-09 1976-02-09 Wafer washing and drying unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1227376A JPS5295967A (en) 1976-02-09 1976-02-09 Wafer washing and drying unit

Publications (1)

Publication Number Publication Date
JPS5295967A true JPS5295967A (en) 1977-08-12

Family

ID=11800747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1227376A Pending JPS5295967A (en) 1976-02-09 1976-02-09 Wafer washing and drying unit

Country Status (1)

Country Link
JP (1) JPS5295967A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56117544U (en) * 1980-02-08 1981-09-08
JPS57196532A (en) * 1981-05-27 1982-12-02 Toshiba Corp Drying device for wafer
JPS5844838U (en) * 1981-09-21 1983-03-25 三菱電機株式会社 Wafer cleaning and drying equipment
JPS605530A (en) * 1984-04-25 1985-01-12 Hitachi Ltd Treating device for wafer surface
JPS63157928U (en) * 1987-04-03 1988-10-17
JPS63252584A (en) * 1987-04-07 1988-10-19 大日本印刷株式会社 cleaning equipment

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56117544U (en) * 1980-02-08 1981-09-08
JPS57196532A (en) * 1981-05-27 1982-12-02 Toshiba Corp Drying device for wafer
JPS5844838U (en) * 1981-09-21 1983-03-25 三菱電機株式会社 Wafer cleaning and drying equipment
JPS605530A (en) * 1984-04-25 1985-01-12 Hitachi Ltd Treating device for wafer surface
JPS63157928U (en) * 1987-04-03 1988-10-17
JPS63252584A (en) * 1987-04-07 1988-10-19 大日本印刷株式会社 cleaning equipment

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