JPS5297801A - Photoosensitive resin composition - Google Patents

Photoosensitive resin composition

Info

Publication number
JPS5297801A
JPS5297801A JP1426176A JP1426176A JPS5297801A JP S5297801 A JPS5297801 A JP S5297801A JP 1426176 A JP1426176 A JP 1426176A JP 1426176 A JP1426176 A JP 1426176A JP S5297801 A JPS5297801 A JP S5297801A
Authority
JP
Japan
Prior art keywords
photoosensitive
resin composition
resin
composition
photoosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1426176A
Other languages
Japanese (ja)
Other versions
JPS5823617B2 (en
Inventor
Atsuzou Noshiro
Hitoshi Fujii
Shinichi Hikosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP1426176A priority Critical patent/JPS5823617B2/en
Publication of JPS5297801A publication Critical patent/JPS5297801A/en
Publication of JPS5823617B2 publication Critical patent/JPS5823617B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Insulating Materials (AREA)
JP1426176A 1976-02-12 1976-02-12 Photosensitive resin composition Expired JPS5823617B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1426176A JPS5823617B2 (en) 1976-02-12 1976-02-12 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1426176A JPS5823617B2 (en) 1976-02-12 1976-02-12 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5297801A true JPS5297801A (en) 1977-08-17
JPS5823617B2 JPS5823617B2 (en) 1983-05-16

Family

ID=11856137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1426176A Expired JPS5823617B2 (en) 1976-02-12 1976-02-12 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5823617B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180360A (en) * 1986-02-03 1987-08-07 ゼネラル・エレクトリツク・カンパニイ Optically patternable polyimide composition and making thereof
JPH05158236A (en) * 1991-12-06 1993-06-25 Hitachi Ltd Plating resist for printed circuit board and manufacture of printed circuit board using same
JP2000191640A (en) * 1998-12-29 2000-07-11 Dainippon Ink & Chem Inc Bismaleimide containing mesogen group

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62180360A (en) * 1986-02-03 1987-08-07 ゼネラル・エレクトリツク・カンパニイ Optically patternable polyimide composition and making thereof
JPH05158236A (en) * 1991-12-06 1993-06-25 Hitachi Ltd Plating resist for printed circuit board and manufacture of printed circuit board using same
JP2000191640A (en) * 1998-12-29 2000-07-11 Dainippon Ink & Chem Inc Bismaleimide containing mesogen group

Also Published As

Publication number Publication date
JPS5823617B2 (en) 1983-05-16

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