JPS5343479A - Thermal oxidation method of semiconductor wafers - Google Patents

Thermal oxidation method of semiconductor wafers

Info

Publication number
JPS5343479A
JPS5343479A JP11817976A JP11817976A JPS5343479A JP S5343479 A JPS5343479 A JP S5343479A JP 11817976 A JP11817976 A JP 11817976A JP 11817976 A JP11817976 A JP 11817976A JP S5343479 A JPS5343479 A JP S5343479A
Authority
JP
Japan
Prior art keywords
thermal oxidation
semiconductor wafers
oxidation method
nozzle
piping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11817976A
Other languages
Japanese (ja)
Inventor
Sokichi Yamagishi
Kenji Atsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11817976A priority Critical patent/JPS5343479A/en
Publication of JPS5343479A publication Critical patent/JPS5343479A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the failure of nozzle and the burn of parts owing to ignition of H2 in the nozzle by flowing a slight amount of an inert gas into the piping of introducing hydrogen into a furnace core tube.
COPYRIGHT: (C)1978,JPO&Japio
JP11817976A 1976-09-30 1976-09-30 Thermal oxidation method of semiconductor wafers Pending JPS5343479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11817976A JPS5343479A (en) 1976-09-30 1976-09-30 Thermal oxidation method of semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11817976A JPS5343479A (en) 1976-09-30 1976-09-30 Thermal oxidation method of semiconductor wafers

Publications (1)

Publication Number Publication Date
JPS5343479A true JPS5343479A (en) 1978-04-19

Family

ID=14730085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11817976A Pending JPS5343479A (en) 1976-09-30 1976-09-30 Thermal oxidation method of semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS5343479A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142790A (en) * 1985-12-17 1987-06-26 Canon Inc Equipment for optical excitation process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142790A (en) * 1985-12-17 1987-06-26 Canon Inc Equipment for optical excitation process

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