JPS534476A - Mask alignment method to semiconductor substrate - Google Patents

Mask alignment method to semiconductor substrate

Info

Publication number
JPS534476A
JPS534476A JP7785676A JP7785676A JPS534476A JP S534476 A JPS534476 A JP S534476A JP 7785676 A JP7785676 A JP 7785676A JP 7785676 A JP7785676 A JP 7785676A JP S534476 A JPS534476 A JP S534476A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
alignment method
mask alignment
patterns
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7785676A
Other languages
Japanese (ja)
Inventor
Shigeharu Abe
Kenji Sugishima
Hideo Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7785676A priority Critical patent/JPS534476A/en
Publication of JPS534476A publication Critical patent/JPS534476A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To facilitate final alignment by providing rough alignment patterns outside of effective chip regions, using the effective regions in element formation and performing highly accurate rough alignment with the two patterns.
COPYRIGHT: (C)1978,JPO&Japio
JP7785676A 1976-07-02 1976-07-02 Mask alignment method to semiconductor substrate Pending JPS534476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7785676A JPS534476A (en) 1976-07-02 1976-07-02 Mask alignment method to semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7785676A JPS534476A (en) 1976-07-02 1976-07-02 Mask alignment method to semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS534476A true JPS534476A (en) 1978-01-17

Family

ID=13645695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7785676A Pending JPS534476A (en) 1976-07-02 1976-07-02 Mask alignment method to semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS534476A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS5657674A (en) * 1979-10-09 1981-05-20 Taiho Kogyo Co Ltd Method of disposing sludge in floating roof type oil tank
JPS58125425A (en) * 1982-01-12 1983-07-26 株式会社新醍醐鉄工所 Vacuum packer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS5657674A (en) * 1979-10-09 1981-05-20 Taiho Kogyo Co Ltd Method of disposing sludge in floating roof type oil tank
JPS58125425A (en) * 1982-01-12 1983-07-26 株式会社新醍醐鉄工所 Vacuum packer

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