JPS5345988A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5345988A
JPS5345988A JP12063376A JP12063376A JPS5345988A JP S5345988 A JPS5345988 A JP S5345988A JP 12063376 A JP12063376 A JP 12063376A JP 12063376 A JP12063376 A JP 12063376A JP S5345988 A JPS5345988 A JP S5345988A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
poly
film
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12063376A
Other languages
Japanese (ja)
Other versions
JPS597222B2 (en
Inventor
Koji Takemae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12063376A priority Critical patent/JPS597222B2/en
Publication of JPS5345988A publication Critical patent/JPS5345988A/en
Publication of JPS597222B2 publication Critical patent/JPS597222B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: The quality of material and thickness of a mask is selected and then, impurities are contained in a poly Si film; and the poly Si film is removed, thereby forming a poly Si film in the prescribed shape.
COPYRIGHT: (C)1978,JPO&Japio
JP12063376A 1976-10-06 1976-10-06 Manufacturing method of semiconductor device Expired JPS597222B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12063376A JPS597222B2 (en) 1976-10-06 1976-10-06 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12063376A JPS597222B2 (en) 1976-10-06 1976-10-06 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5345988A true JPS5345988A (en) 1978-04-25
JPS597222B2 JPS597222B2 (en) 1984-02-17

Family

ID=14791042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12063376A Expired JPS597222B2 (en) 1976-10-06 1976-10-06 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS597222B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043U (en) * 1983-06-14 1985-01-05 大同特殊鋼株式会社 Buffer mechanism in gripping device for long materials

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6043U (en) * 1983-06-14 1985-01-05 大同特殊鋼株式会社 Buffer mechanism in gripping device for long materials

Also Published As

Publication number Publication date
JPS597222B2 (en) 1984-02-17

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