JPS53516A - Method of collecting magnetic waste material - Google Patents
Method of collecting magnetic waste materialInfo
- Publication number
- JPS53516A JPS53516A JP7394676A JP7394676A JPS53516A JP S53516 A JPS53516 A JP S53516A JP 7394676 A JP7394676 A JP 7394676A JP 7394676 A JP7394676 A JP 7394676A JP S53516 A JPS53516 A JP S53516A
- Authority
- JP
- Japan
- Prior art keywords
- waste material
- collecting magnetic
- magnetic waste
- collecting
- waste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002699 waste material Substances 0.000 title 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7394676A JPS53516A (en) | 1976-06-23 | 1976-06-23 | Method of collecting magnetic waste material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7394676A JPS53516A (en) | 1976-06-23 | 1976-06-23 | Method of collecting magnetic waste material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS53516A true JPS53516A (en) | 1978-01-06 |
Family
ID=13532766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7394676A Pending JPS53516A (en) | 1976-06-23 | 1976-06-23 | Method of collecting magnetic waste material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53516A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5763697U (en) * | 1980-10-02 | 1982-04-15 | ||
| US4689288A (en) * | 1984-09-21 | 1987-08-25 | Commissariat A L'energie Atomique | Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS502597U (en) * | 1973-05-02 | 1975-01-11 |
-
1976
- 1976-06-23 JP JP7394676A patent/JPS53516A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS502597U (en) * | 1973-05-02 | 1975-01-11 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5763697U (en) * | 1980-10-02 | 1982-04-15 | ||
| US4689288A (en) * | 1984-09-21 | 1987-08-25 | Commissariat A L'energie Atomique | Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process |
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