JPS5353401A - Photoetching of polyimide synthetic resin film - Google Patents

Photoetching of polyimide synthetic resin film

Info

Publication number
JPS5353401A
JPS5353401A JP12608676A JP12608676A JPS5353401A JP S5353401 A JPS5353401 A JP S5353401A JP 12608676 A JP12608676 A JP 12608676A JP 12608676 A JP12608676 A JP 12608676A JP S5353401 A JPS5353401 A JP S5353401A
Authority
JP
Japan
Prior art keywords
photoetching
synthetic resin
resin film
polyimide synthetic
polyimide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12608676A
Other languages
Japanese (ja)
Inventor
Shigeo Kubo
Tatsu Itou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12608676A priority Critical patent/JPS5353401A/en
Publication of JPS5353401A publication Critical patent/JPS5353401A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12608676A 1976-10-22 1976-10-22 Photoetching of polyimide synthetic resin film Pending JPS5353401A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12608676A JPS5353401A (en) 1976-10-22 1976-10-22 Photoetching of polyimide synthetic resin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12608676A JPS5353401A (en) 1976-10-22 1976-10-22 Photoetching of polyimide synthetic resin film

Publications (1)

Publication Number Publication Date
JPS5353401A true JPS5353401A (en) 1978-05-15

Family

ID=14926248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12608676A Pending JPS5353401A (en) 1976-10-22 1976-10-22 Photoetching of polyimide synthetic resin film

Country Status (1)

Country Link
JP (1) JPS5353401A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104026U (en) * 1980-12-18 1982-06-26
JPS60164323A (en) * 1984-02-06 1985-08-27 Rohm Co Ltd Manufacture of semiconductor device
JPH0248666A (en) * 1988-07-13 1990-02-19 Internatl Business Mach Corp <Ibm> Wet type etching of polyimide hardened thermally and chemically
US5955779A (en) * 1994-05-24 1999-09-21 Hitachi Chemical Company, Ltd. Method of forming resin film of desired pattern on semiconductor substrate, semiconductor chip, semiconductor package, and resist image remover

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57104026U (en) * 1980-12-18 1982-06-26
JPS60164323A (en) * 1984-02-06 1985-08-27 Rohm Co Ltd Manufacture of semiconductor device
JPH0248666A (en) * 1988-07-13 1990-02-19 Internatl Business Mach Corp <Ibm> Wet type etching of polyimide hardened thermally and chemically
US5955779A (en) * 1994-05-24 1999-09-21 Hitachi Chemical Company, Ltd. Method of forming resin film of desired pattern on semiconductor substrate, semiconductor chip, semiconductor package, and resist image remover
US5958653A (en) * 1994-05-24 1999-09-28 Hitachi Chemical Company, Ltd. Method of forming resin film of desired pattern on semiconductor substrate, semiconductor chip, semiconductor package

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