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Fujitsu Ltd
Original Assignee
Fujitsu Ltd
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Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP14275876ApriorityCriticalpatent/JPS5367351A/en
Publication of JPS5367351ApublicationCriticalpatent/JPS5367351A/en
Testing Or Measuring Of Semiconductors Or The Like
(AREA)
Abstract
PURPOSE: To ensure an accurate measurement for the resistivity of the semiconductor layer and the intrinsic ontact resistance between the semiconductor layer and the electrode metal.
COPYRIGHT: (C)1978,JPO&Japio
JP14275876A1976-11-271976-11-27Measuring method of resistivity and intrinsic contact resistance
PendingJPS5367351A
(en)