JPS5367751A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS5367751A
JPS5367751A JP14414576A JP14414576A JPS5367751A JP S5367751 A JPS5367751 A JP S5367751A JP 14414576 A JP14414576 A JP 14414576A JP 14414576 A JP14414576 A JP 14414576A JP S5367751 A JPS5367751 A JP S5367751A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
water
developed
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14414576A
Other languages
Japanese (ja)
Other versions
JPS6016986B2 (en
Inventor
Yoshio Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP14414576A priority Critical patent/JPS6016986B2/en
Publication of JPS5367751A publication Critical patent/JPS5367751A/en
Publication of JPS6016986B2 publication Critical patent/JPS6016986B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: A specific phospate ester monomer is added to a water-soluble high polymer to provide title resin composition that can be developed with water, and can prevent the waste water from including heavy metals after the developing process.
COPYRIGHT: (C)1978,JPO&Japio
JP14414576A 1976-11-30 1976-11-30 Photosensitive resin composition Expired JPS6016986B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14414576A JPS6016986B2 (en) 1976-11-30 1976-11-30 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14414576A JPS6016986B2 (en) 1976-11-30 1976-11-30 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5367751A true JPS5367751A (en) 1978-06-16
JPS6016986B2 JPS6016986B2 (en) 1985-04-30

Family

ID=15355259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14414576A Expired JPS6016986B2 (en) 1976-11-30 1976-11-30 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS6016986B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02285349A (en) * 1989-04-27 1990-11-22 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JPH02304441A (en) * 1989-05-18 1990-12-18 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JPH04116558A (en) * 1990-09-07 1992-04-17 Tokyo Ohka Kogyo Co Ltd Photosensitive phosphor paste composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02285349A (en) * 1989-04-27 1990-11-22 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JPH02304441A (en) * 1989-05-18 1990-12-18 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JPH04116558A (en) * 1990-09-07 1992-04-17 Tokyo Ohka Kogyo Co Ltd Photosensitive phosphor paste composition

Also Published As

Publication number Publication date
JPS6016986B2 (en) 1985-04-30

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