JPS537584A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS537584A
JPS537584A JP8210276A JP8210276A JPS537584A JP S537584 A JPS537584 A JP S537584A JP 8210276 A JP8210276 A JP 8210276A JP 8210276 A JP8210276 A JP 8210276A JP S537584 A JPS537584 A JP S537584A
Authority
JP
Japan
Prior art keywords
sputtering apparatus
equipping
sputtered
sputter
servomotor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8210276A
Other languages
Japanese (ja)
Inventor
Hideo Ichinomiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8210276A priority Critical patent/JPS537584A/en
Publication of JPS537584A publication Critical patent/JPS537584A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To enable to sputter with the optional pattern and film thickness, by equipping movable sputtering means, able to move on the surface, parallel to the substrate to be sputtered, by moving regulation means, such as servomotor, from outside in the vacuum vessel.
JP8210276A 1976-07-09 1976-07-09 Sputtering apparatus Pending JPS537584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8210276A JPS537584A (en) 1976-07-09 1976-07-09 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8210276A JPS537584A (en) 1976-07-09 1976-07-09 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS537584A true JPS537584A (en) 1978-01-24

Family

ID=13765041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8210276A Pending JPS537584A (en) 1976-07-09 1976-07-09 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS537584A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6393857A (en) * 1986-10-06 1988-04-25 Ishikawajima Harima Heavy Ind Co Ltd Sputtering device
JPH06145970A (en) * 1992-10-30 1994-05-27 Shimadzu Corp Sputtering equipment and its power supply

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6393857A (en) * 1986-10-06 1988-04-25 Ishikawajima Harima Heavy Ind Co Ltd Sputtering device
JPH06145970A (en) * 1992-10-30 1994-05-27 Shimadzu Corp Sputtering equipment and its power supply

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