JPS537584A - Sputtering apparatus - Google Patents
Sputtering apparatusInfo
- Publication number
- JPS537584A JPS537584A JP8210276A JP8210276A JPS537584A JP S537584 A JPS537584 A JP S537584A JP 8210276 A JP8210276 A JP 8210276A JP 8210276 A JP8210276 A JP 8210276A JP S537584 A JPS537584 A JP S537584A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering apparatus
- equipping
- sputtered
- sputter
- servomotor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To enable to sputter with the optional pattern and film thickness, by equipping movable sputtering means, able to move on the surface, parallel to the substrate to be sputtered, by moving regulation means, such as servomotor, from outside in the vacuum vessel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8210276A JPS537584A (en) | 1976-07-09 | 1976-07-09 | Sputtering apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8210276A JPS537584A (en) | 1976-07-09 | 1976-07-09 | Sputtering apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS537584A true JPS537584A (en) | 1978-01-24 |
Family
ID=13765041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8210276A Pending JPS537584A (en) | 1976-07-09 | 1976-07-09 | Sputtering apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS537584A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6393857A (en) * | 1986-10-06 | 1988-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Sputtering device |
| JPH06145970A (en) * | 1992-10-30 | 1994-05-27 | Shimadzu Corp | Sputtering equipment and its power supply |
-
1976
- 1976-07-09 JP JP8210276A patent/JPS537584A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6393857A (en) * | 1986-10-06 | 1988-04-25 | Ishikawajima Harima Heavy Ind Co Ltd | Sputtering device |
| JPH06145970A (en) * | 1992-10-30 | 1994-05-27 | Shimadzu Corp | Sputtering equipment and its power supply |
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