JPS5376754A - Resist removing method - Google Patents

Resist removing method

Info

Publication number
JPS5376754A
JPS5376754A JP15189676A JP15189676A JPS5376754A JP S5376754 A JPS5376754 A JP S5376754A JP 15189676 A JP15189676 A JP 15189676A JP 15189676 A JP15189676 A JP 15189676A JP S5376754 A JPS5376754 A JP S5376754A
Authority
JP
Japan
Prior art keywords
removing method
resist removing
wafers
ozone
underside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15189676A
Other languages
Japanese (ja)
Inventor
Takashi Nao
Juichi Osuzu
Ryosuke Namazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15189676A priority Critical patent/JPS5376754A/en
Publication of JPS5376754A publication Critical patent/JPS5376754A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To remove resist films completely by injecting oxygen or ozone from the underside of wafers in a concentrated sulfuric acid.
COPYRIGHT: (C)1978,JPO&Japio
JP15189676A 1976-12-20 1976-12-20 Resist removing method Pending JPS5376754A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15189676A JPS5376754A (en) 1976-12-20 1976-12-20 Resist removing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15189676A JPS5376754A (en) 1976-12-20 1976-12-20 Resist removing method

Publications (1)

Publication Number Publication Date
JPS5376754A true JPS5376754A (en) 1978-07-07

Family

ID=15528553

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15189676A Pending JPS5376754A (en) 1976-12-20 1976-12-20 Resist removing method

Country Status (1)

Country Link
JP (1) JPS5376754A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108746A (en) * 1981-12-22 1983-06-28 Fujitsu Ltd Process of cleaning wafer
US5443942A (en) * 1990-11-28 1995-08-22 Canon Kabushiki Kaisha Process for removing resist
KR100499629B1 (en) * 2002-07-16 2005-07-05 주식회사 하이닉스반도체 Manufacturing Method of Semiconductor Device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108746A (en) * 1981-12-22 1983-06-28 Fujitsu Ltd Process of cleaning wafer
US5443942A (en) * 1990-11-28 1995-08-22 Canon Kabushiki Kaisha Process for removing resist
KR100499629B1 (en) * 2002-07-16 2005-07-05 주식회사 하이닉스반도체 Manufacturing Method of Semiconductor Device

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