JPS5381114A - Radiation sensitive material - Google Patents
Radiation sensitive materialInfo
- Publication number
- JPS5381114A JPS5381114A JP15692776A JP15692776A JPS5381114A JP S5381114 A JPS5381114 A JP S5381114A JP 15692776 A JP15692776 A JP 15692776A JP 15692776 A JP15692776 A JP 15692776A JP S5381114 A JPS5381114 A JP S5381114A
- Authority
- JP
- Japan
- Prior art keywords
- radiation sensitive
- sensitive material
- radiation
- copolymerrize
- methacrylonitrile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 2
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
Abstract
PURPOSE: To cause the title material to have high sensitivity to radiation and to easily form a minute and highly precise pattern or the like, by allowing methacrylonitrile to copolymerrize with a monomer capable of becoming a positive type radiation sensitive high polymer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15692776A JPS5381114A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15692776A JPS5381114A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5381114A true JPS5381114A (en) | 1978-07-18 |
Family
ID=15638397
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15692776A Pending JPS5381114A (en) | 1976-12-25 | 1976-12-25 | Radiation sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5381114A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153633A (en) * | 1978-05-22 | 1979-12-04 | Western Electric Co | Article having phosphorographic resist layer and method of producing same |
| JPS5858734A (en) * | 1981-05-07 | 1983-04-07 | ハネウエル・インコ−ポレ−テツド | Method of generating positive electronic resist video with high sensitivity |
| US4594309A (en) * | 1984-10-31 | 1986-06-10 | Allied Corporation | α,β Diketone containing polymers as positive photoresist compositions |
| EP1091249A1 (en) * | 1999-10-07 | 2001-04-11 | Shipley Company LLC | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same |
| JP2019045721A (en) * | 2017-09-04 | 2019-03-22 | キヤノン株式会社 | Conductive member for electrophotography and manufacturing method thereof, process cartridge, and electrophotographic device |
-
1976
- 1976-12-25 JP JP15692776A patent/JPS5381114A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153633A (en) * | 1978-05-22 | 1979-12-04 | Western Electric Co | Article having phosphorographic resist layer and method of producing same |
| JPS5858734A (en) * | 1981-05-07 | 1983-04-07 | ハネウエル・インコ−ポレ−テツド | Method of generating positive electronic resist video with high sensitivity |
| US4594309A (en) * | 1984-10-31 | 1986-06-10 | Allied Corporation | α,β Diketone containing polymers as positive photoresist compositions |
| EP1091249A1 (en) * | 1999-10-07 | 2001-04-11 | Shipley Company LLC | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same |
| SG83819A1 (en) * | 1999-10-07 | 2001-10-16 | Shipley Co Llc | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| US6692888B1 (en) | 1999-10-07 | 2004-02-17 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| US7090968B2 (en) | 1999-10-07 | 2006-08-15 | Shipley Company, L.L.C. | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same |
| KR100880409B1 (en) * | 1999-10-07 | 2009-01-23 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions containing them |
| JP2019045721A (en) * | 2017-09-04 | 2019-03-22 | キヤノン株式会社 | Conductive member for electrophotography and manufacturing method thereof, process cartridge, and electrophotographic device |
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