JPS5381114A - Radiation sensitive material - Google Patents

Radiation sensitive material

Info

Publication number
JPS5381114A
JPS5381114A JP15692776A JP15692776A JPS5381114A JP S5381114 A JPS5381114 A JP S5381114A JP 15692776 A JP15692776 A JP 15692776A JP 15692776 A JP15692776 A JP 15692776A JP S5381114 A JPS5381114 A JP S5381114A
Authority
JP
Japan
Prior art keywords
radiation sensitive
sensitive material
radiation
copolymerrize
methacrylonitrile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15692776A
Other languages
Japanese (ja)
Inventor
Masataka Miyamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15692776A priority Critical patent/JPS5381114A/en
Publication of JPS5381114A publication Critical patent/JPS5381114A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To cause the title material to have high sensitivity to radiation and to easily form a minute and highly precise pattern or the like, by allowing methacrylonitrile to copolymerrize with a monomer capable of becoming a positive type radiation sensitive high polymer.
COPYRIGHT: (C)1978,JPO&Japio
JP15692776A 1976-12-25 1976-12-25 Radiation sensitive material Pending JPS5381114A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15692776A JPS5381114A (en) 1976-12-25 1976-12-25 Radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15692776A JPS5381114A (en) 1976-12-25 1976-12-25 Radiation sensitive material

Publications (1)

Publication Number Publication Date
JPS5381114A true JPS5381114A (en) 1978-07-18

Family

ID=15638397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15692776A Pending JPS5381114A (en) 1976-12-25 1976-12-25 Radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS5381114A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153633A (en) * 1978-05-22 1979-12-04 Western Electric Co Article having phosphorographic resist layer and method of producing same
JPS5858734A (en) * 1981-05-07 1983-04-07 ハネウエル・インコ−ポレ−テツド Method of generating positive electronic resist video with high sensitivity
US4594309A (en) * 1984-10-31 1986-06-10 Allied Corporation α,β Diketone containing polymers as positive photoresist compositions
EP1091249A1 (en) * 1999-10-07 2001-04-11 Shipley Company LLC Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same
JP2019045721A (en) * 2017-09-04 2019-03-22 キヤノン株式会社 Conductive member for electrophotography and manufacturing method thereof, process cartridge, and electrophotographic device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153633A (en) * 1978-05-22 1979-12-04 Western Electric Co Article having phosphorographic resist layer and method of producing same
JPS5858734A (en) * 1981-05-07 1983-04-07 ハネウエル・インコ−ポレ−テツド Method of generating positive electronic resist video with high sensitivity
US4594309A (en) * 1984-10-31 1986-06-10 Allied Corporation α,β Diketone containing polymers as positive photoresist compositions
EP1091249A1 (en) * 1999-10-07 2001-04-11 Shipley Company LLC Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same
SG83819A1 (en) * 1999-10-07 2001-10-16 Shipley Co Llc Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
US6692888B1 (en) 1999-10-07 2004-02-17 Shipley Company, L.L.C. Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
US7090968B2 (en) 1999-10-07 2006-08-15 Shipley Company, L.L.C. Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
KR100880409B1 (en) * 1999-10-07 2009-01-23 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions containing them
JP2019045721A (en) * 2017-09-04 2019-03-22 キヤノン株式会社 Conductive member for electrophotography and manufacturing method thereof, process cartridge, and electrophotographic device

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