JPS539472A - Observation apparatus of pattern position deviation - Google Patents

Observation apparatus of pattern position deviation

Info

Publication number
JPS539472A
JPS539472A JP8300076A JP8300076A JPS539472A JP S539472 A JPS539472 A JP S539472A JP 8300076 A JP8300076 A JP 8300076A JP 8300076 A JP8300076 A JP 8300076A JP S539472 A JPS539472 A JP S539472A
Authority
JP
Japan
Prior art keywords
position deviation
observation apparatus
pattern position
pattern
focuses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8300076A
Other languages
Japanese (ja)
Other versions
JPS5341506B2 (en
Inventor
Minoru Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8300076A priority Critical patent/JPS539472A/en
Publication of JPS539472A publication Critical patent/JPS539472A/en
Publication of JPS5341506B2 publication Critical patent/JPS5341506B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To observe the position deviation of the light impage of each superposed pattern by elastically supporting the inner tube of a microscope fitted with an objective lens from the position where it focuses on one of the patterns to the position where it focuses on the other pattern.
COPYRIGHT: (C)1978,JPO&Japio
JP8300076A 1976-07-14 1976-07-14 Observation apparatus of pattern position deviation Granted JPS539472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8300076A JPS539472A (en) 1976-07-14 1976-07-14 Observation apparatus of pattern position deviation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8300076A JPS539472A (en) 1976-07-14 1976-07-14 Observation apparatus of pattern position deviation

Publications (2)

Publication Number Publication Date
JPS539472A true JPS539472A (en) 1978-01-27
JPS5341506B2 JPS5341506B2 (en) 1978-11-04

Family

ID=13789952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8300076A Granted JPS539472A (en) 1976-07-14 1976-07-14 Observation apparatus of pattern position deviation

Country Status (1)

Country Link
JP (1) JPS539472A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112123A (en) * 1989-09-27 1991-05-13 Canon Inc Aligner

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5341608A (en) * 1976-09-29 1978-04-15 Hitachi Ltd Condensate tank of condenser

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112123A (en) * 1989-09-27 1991-05-13 Canon Inc Aligner

Also Published As

Publication number Publication date
JPS5341506B2 (en) 1978-11-04

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