JPS5419663A - Forming method of insulating films - Google Patents

Forming method of insulating films

Info

Publication number
JPS5419663A
JPS5419663A JP8477677A JP8477677A JPS5419663A JP S5419663 A JPS5419663 A JP S5419663A JP 8477677 A JP8477677 A JP 8477677A JP 8477677 A JP8477677 A JP 8477677A JP S5419663 A JPS5419663 A JP S5419663A
Authority
JP
Japan
Prior art keywords
forming method
insulating films
substrates
films
dense
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8477677A
Other languages
Japanese (ja)
Other versions
JPS5645299B2 (en
Inventor
Takashi Ito
Takao Nozaki
Masaichi Shinoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8477677A priority Critical patent/JPS5419663A/en
Publication of JPS5419663A publication Critical patent/JPS5419663A/en
Publication of JPS5645299B2 publication Critical patent/JPS5645299B2/ja
Granted legal-status Critical Current

Links

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  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To let N2 atoms directly react with Si substrates and obtain stable and dense Si3N4 films by heating the Si substrates in an atmosphere of NH3 containing less than 0.01% of O2, H2O or gas containing NH3.
COPYRIGHT: (C)1979,JPO&Japio
JP8477677A 1977-07-15 1977-07-15 Forming method of insulating films Granted JPS5419663A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8477677A JPS5419663A (en) 1977-07-15 1977-07-15 Forming method of insulating films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8477677A JPS5419663A (en) 1977-07-15 1977-07-15 Forming method of insulating films

Publications (2)

Publication Number Publication Date
JPS5419663A true JPS5419663A (en) 1979-02-14
JPS5645299B2 JPS5645299B2 (en) 1981-10-26

Family

ID=13840072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8477677A Granted JPS5419663A (en) 1977-07-15 1977-07-15 Forming method of insulating films

Country Status (1)

Country Link
JP (1) JPS5419663A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980001740A1 (en) * 1979-02-19 1980-08-21 Fujitsu Ltd Method of producing semiconductor devices
WO1980001739A1 (en) * 1979-02-19 1980-08-21 Fujitsu Ltd Method of producing insulating film for semiconductor surfaces
JPS5754332A (en) * 1980-09-19 1982-03-31 Nec Corp Forming method for thermonitride silicon film
WO1983000773A1 (en) * 1979-02-27 1983-03-03 Takao Nozaki Method of producing semiconductor devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5199980A (en) * 1975-02-28 1976-09-03 Fujitsu Ltd mis gatahandotaisochi
JPS51103774A (en) * 1975-03-10 1976-09-13 Fujitsu Ltd HANDOTAISOCHINOSEIZOHOHO
JPS51105270A (en) * 1975-03-13 1976-09-17 Fujitsu Ltd HANDOTAIHYOMENZETSUENMAKUNO KEISEIHOHO

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5199980A (en) * 1975-02-28 1976-09-03 Fujitsu Ltd mis gatahandotaisochi
JPS51103774A (en) * 1975-03-10 1976-09-13 Fujitsu Ltd HANDOTAISOCHINOSEIZOHOHO
JPS51105270A (en) * 1975-03-13 1976-09-17 Fujitsu Ltd HANDOTAIHYOMENZETSUENMAKUNO KEISEIHOHO

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1980001740A1 (en) * 1979-02-19 1980-08-21 Fujitsu Ltd Method of producing semiconductor devices
WO1980001739A1 (en) * 1979-02-19 1980-08-21 Fujitsu Ltd Method of producing insulating film for semiconductor surfaces
WO1983000773A1 (en) * 1979-02-27 1983-03-03 Takao Nozaki Method of producing semiconductor devices
JPS5754332A (en) * 1980-09-19 1982-03-31 Nec Corp Forming method for thermonitride silicon film

Also Published As

Publication number Publication date
JPS5645299B2 (en) 1981-10-26

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