JPS5429397A - Preparation of novel resist materrial - Google Patents

Preparation of novel resist materrial

Info

Publication number
JPS5429397A
JPS5429397A JP9545677A JP9545677A JPS5429397A JP S5429397 A JPS5429397 A JP S5429397A JP 9545677 A JP9545677 A JP 9545677A JP 9545677 A JP9545677 A JP 9545677A JP S5429397 A JPS5429397 A JP S5429397A
Authority
JP
Japan
Prior art keywords
materrial
preparation
novel resist
resist
novel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9545677A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6129493B2 (fr
Inventor
Hideo Ochi
Yoshii Shibata
Koutarou Nagasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Manufacturing Co Ltd filed Critical Somar Manufacturing Co Ltd
Priority to JP9545677A priority Critical patent/JPS5429397A/ja
Priority to AU38704/78A priority patent/AU3870478A/en
Priority to NL787808279A priority patent/NL7808279A/xx
Priority to GB7832662A priority patent/GB2004283B/en
Priority to FR7823372A priority patent/FR2400042A1/fr
Priority to BE189772A priority patent/BE869607A/fr
Priority to DE19782834791 priority patent/DE2834791A1/de
Priority to US05/932,160 priority patent/US4299911A/en
Priority to IT50684/78A priority patent/IT1106873B/it
Publication of JPS5429397A publication Critical patent/JPS5429397A/ja
Publication of JPS6129493B2 publication Critical patent/JPS6129493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP9545677A 1977-08-09 1977-08-09 Preparation of novel resist materrial Granted JPS5429397A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP9545677A JPS5429397A (en) 1977-08-09 1977-08-09 Preparation of novel resist materrial
AU38704/78A AU3870478A (en) 1977-08-09 1978-08-07 High energy radiation cruable resist material
NL787808279A NL7808279A (nl) 1977-08-09 1978-08-08 Resistmateriaal en werkwijze voor het gebruik daarvan.
GB7832662A GB2004283B (en) 1977-08-09 1978-08-08 High energy radiation curable resist material and method of using the same
FR7823372A FR2400042A1 (fr) 1977-08-09 1978-08-08 Materiau de protection durcissable sous l'effet de radiations de haute energie et son procede d'utilisation
BE189772A BE869607A (fr) 1977-08-09 1978-08-08 Matiere de reserve durcissable par des radiations de haute energie et procede d'utilisation de cette matiere
DE19782834791 DE2834791A1 (de) 1977-08-09 1978-08-09 Durch hochenergetische strahlung haertbares resistmaterial und herstellungsverfahren
US05/932,160 US4299911A (en) 1977-08-09 1978-08-09 High energy radiation curable resist material and method of using the same
IT50684/78A IT1106873B (it) 1977-08-09 1978-08-09 Materiale di riserva induribile mediante irradiazione e procedimento per produrlo

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9545677A JPS5429397A (en) 1977-08-09 1977-08-09 Preparation of novel resist materrial

Publications (2)

Publication Number Publication Date
JPS5429397A true JPS5429397A (en) 1979-03-05
JPS6129493B2 JPS6129493B2 (fr) 1986-07-07

Family

ID=14138175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9545677A Granted JPS5429397A (en) 1977-08-09 1977-08-09 Preparation of novel resist materrial

Country Status (2)

Country Link
JP (1) JPS5429397A (fr)
BE (1) BE869607A (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54161319A (en) * 1978-06-12 1979-12-20 Somar Mfg High energy beam setting resist material and method of using same
JPS5544379U (fr) * 1979-07-19 1980-03-22
JPS5762478A (en) * 1980-10-02 1982-04-15 Matsushita Electric Industrial Co Ltd Optical identifying method for notes or like
JPS5763211A (en) * 1980-10-06 1982-04-16 Showa Electric Wire & Cable Co Ltd Feed control of extruded coating material
JPS57159393A (en) * 1981-03-27 1982-10-01 Fujitsu Ltd Sheet paper discriminator
US6050387A (en) * 1997-09-10 2000-04-18 Yokohama Denshi Kogyo Kabushiki Kaisha Device and method for identifying bank note
GB2438494A (en) * 2004-11-16 2007-11-28 Nippon Conlux Co Ltd Sheet recognizing device and method

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54161319A (en) * 1978-06-12 1979-12-20 Somar Mfg High energy beam setting resist material and method of using same
JPS5544379U (fr) * 1979-07-19 1980-03-22
JPS5762478A (en) * 1980-10-02 1982-04-15 Matsushita Electric Industrial Co Ltd Optical identifying method for notes or like
JPS5763211A (en) * 1980-10-06 1982-04-16 Showa Electric Wire & Cable Co Ltd Feed control of extruded coating material
JPS57159393A (en) * 1981-03-27 1982-10-01 Fujitsu Ltd Sheet paper discriminator
US6050387A (en) * 1997-09-10 2000-04-18 Yokohama Denshi Kogyo Kabushiki Kaisha Device and method for identifying bank note
GB2438494A (en) * 2004-11-16 2007-11-28 Nippon Conlux Co Ltd Sheet recognizing device and method
US7586592B2 (en) 2004-11-16 2009-09-08 Kabushiki Kaisha Nippon Conlux Sheet recognizing device and method

Also Published As

Publication number Publication date
JPS6129493B2 (fr) 1986-07-07
BE869607A (fr) 1978-12-01

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