JPS542941A - Metal film patterning method - Google Patents

Metal film patterning method

Info

Publication number
JPS542941A
JPS542941A JP6813477A JP6813477A JPS542941A JP S542941 A JPS542941 A JP S542941A JP 6813477 A JP6813477 A JP 6813477A JP 6813477 A JP6813477 A JP 6813477A JP S542941 A JPS542941 A JP S542941A
Authority
JP
Japan
Prior art keywords
metal film
patterning method
film patterning
forming
good
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6813477A
Other languages
Japanese (ja)
Inventor
Kazunari Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6813477A priority Critical patent/JPS542941A/en
Publication of JPS542941A publication Critical patent/JPS542941A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To carry out patterning of good finish with good work efficiency by selectively forming a photoresist film on a wafer and forming a metal film on the whole surface after which a pressurized fluid is sprayed.
JP6813477A 1977-06-09 1977-06-09 Metal film patterning method Pending JPS542941A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6813477A JPS542941A (en) 1977-06-09 1977-06-09 Metal film patterning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6813477A JPS542941A (en) 1977-06-09 1977-06-09 Metal film patterning method

Publications (1)

Publication Number Publication Date
JPS542941A true JPS542941A (en) 1979-01-10

Family

ID=13364959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6813477A Pending JPS542941A (en) 1977-06-09 1977-06-09 Metal film patterning method

Country Status (1)

Country Link
JP (1) JPS542941A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61172715U (en) * 1985-04-15 1986-10-27
JP2003086531A (en) * 2001-09-07 2003-03-20 Seiko Instruments Inc Method for manufacturing pattern electrode, and pattern electrode manufactured by the method
US7291278B2 (en) 2003-09-17 2007-11-06 Seiko Epson Corporation Electrode forming method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61172715U (en) * 1985-04-15 1986-10-27
JP2003086531A (en) * 2001-09-07 2003-03-20 Seiko Instruments Inc Method for manufacturing pattern electrode, and pattern electrode manufactured by the method
US7291278B2 (en) 2003-09-17 2007-11-06 Seiko Epson Corporation Electrode forming method

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