JPS5437579A - Chrome plate - Google Patents
Chrome plateInfo
- Publication number
- JPS5437579A JPS5437579A JP10447577A JP10447577A JPS5437579A JP S5437579 A JPS5437579 A JP S5437579A JP 10447577 A JP10447577 A JP 10447577A JP 10447577 A JP10447577 A JP 10447577A JP S5437579 A JPS5437579 A JP S5437579A
- Authority
- JP
- Japan
- Prior art keywords
- chrome plate
- chrome
- plate
- crox
- atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To manufacture a high-precision mask by setting the density of O in CrOx to 0 to 0.01 or 0.1 to 2.5 at an atom-number ratio of O to Cr and by providing a thin film of no oxide to the interface between a Cr film surface and transparent substrate at need.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10447577A JPS5437579A (en) | 1977-08-30 | 1977-08-30 | Chrome plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10447577A JPS5437579A (en) | 1977-08-30 | 1977-08-30 | Chrome plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5437579A true JPS5437579A (en) | 1979-03-20 |
Family
ID=14381590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10447577A Pending JPS5437579A (en) | 1977-08-30 | 1977-08-30 | Chrome plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5437579A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018155047A1 (en) * | 2017-02-27 | 2018-08-30 | Hoya株式会社 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| US11119400B2 (en) | 2017-04-08 | 2021-09-14 | Hoya Corporation | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
-
1977
- 1977-08-30 JP JP10447577A patent/JPS5437579A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018155047A1 (en) * | 2017-02-27 | 2018-08-30 | Hoya株式会社 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| JP2018141969A (en) * | 2017-02-27 | 2018-09-13 | Hoya株式会社 | Mask blank, transfer mask manufacturing method, and semiconductor device manufacturing method |
| JP2019012287A (en) * | 2017-02-27 | 2019-01-24 | Hoya株式会社 | Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device |
| JP2019200440A (en) * | 2017-02-27 | 2019-11-21 | Hoya株式会社 | Mask blank and method for manufacturing imprint mold |
| TWI726192B (en) * | 2017-02-27 | 2021-05-01 | 日商Hoya股份有限公司 | Mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device |
| US11281089B2 (en) | 2017-02-27 | 2022-03-22 | Hoya Corporation | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| US11119400B2 (en) | 2017-04-08 | 2021-09-14 | Hoya Corporation | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| US11435662B2 (en) | 2017-04-08 | 2022-09-06 | Hoya Corporation | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
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