JPS544076A - Irradiation unit for far ultraviolet ray exposure - Google Patents

Irradiation unit for far ultraviolet ray exposure

Info

Publication number
JPS544076A
JPS544076A JP6880377A JP6880377A JPS544076A JP S544076 A JPS544076 A JP S544076A JP 6880377 A JP6880377 A JP 6880377A JP 6880377 A JP6880377 A JP 6880377A JP S544076 A JPS544076 A JP S544076A
Authority
JP
Japan
Prior art keywords
ultraviolet ray
far ultraviolet
irradiation unit
ray exposure
ring shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6880377A
Other languages
Japanese (ja)
Other versions
JPS5637693B2 (en
Inventor
Yoshiaki Mimura
Takashi Okubo
Tatsuo Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6880377A priority Critical patent/JPS544076A/en
Publication of JPS544076A publication Critical patent/JPS544076A/en
Publication of JPS5637693B2 publication Critical patent/JPS5637693B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To establish ultraviolet ray beam having high energy density and controlled for the incident angle accurately and uniformly, by combinating mercury arc light in ring shape having high emission energy at far ultraviolet ray region and ring shape reflecting mirror placed at the back of the arc light.
COPYRIGHT: (C)1979,JPO&Japio
JP6880377A 1977-06-13 1977-06-13 Irradiation unit for far ultraviolet ray exposure Granted JPS544076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6880377A JPS544076A (en) 1977-06-13 1977-06-13 Irradiation unit for far ultraviolet ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6880377A JPS544076A (en) 1977-06-13 1977-06-13 Irradiation unit for far ultraviolet ray exposure

Publications (2)

Publication Number Publication Date
JPS544076A true JPS544076A (en) 1979-01-12
JPS5637693B2 JPS5637693B2 (en) 1981-09-02

Family

ID=13384231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6880377A Granted JPS544076A (en) 1977-06-13 1977-06-13 Irradiation unit for far ultraviolet ray exposure

Country Status (1)

Country Link
JP (1) JPS544076A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55103722A (en) * 1979-02-01 1980-08-08 Ushio Inc Pattern forming method
JPS55103721A (en) * 1979-02-01 1980-08-08 Ushio Inc Pattern forming method
JPS566436A (en) * 1979-06-27 1981-01-23 Ushio Inc Pattern formation
JP2019109431A (en) * 2017-12-20 2019-07-04 株式会社オーク製作所 Light source device, exposure equipment, and assembly method of light source device
JP2020021813A (en) * 2018-07-31 2020-02-06 東京エレクトロン株式会社 Substrate processing apparatus, substrate processing method and storage medium

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509618A (en) * 1973-05-29 1975-01-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509618A (en) * 1973-05-29 1975-01-31

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55103722A (en) * 1979-02-01 1980-08-08 Ushio Inc Pattern forming method
JPS55103721A (en) * 1979-02-01 1980-08-08 Ushio Inc Pattern forming method
JPS566436A (en) * 1979-06-27 1981-01-23 Ushio Inc Pattern formation
JP2019109431A (en) * 2017-12-20 2019-07-04 株式会社オーク製作所 Light source device, exposure equipment, and assembly method of light source device
JP2020021813A (en) * 2018-07-31 2020-02-06 東京エレクトロン株式会社 Substrate processing apparatus, substrate processing method and storage medium
TWI829724B (en) * 2018-07-31 2024-01-21 日商東京威力科創股份有限公司 Substrate processing device, substrate processing method and storage medium

Also Published As

Publication number Publication date
JPS5637693B2 (en) 1981-09-02

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