JPS5456370A - Mask pattern correcting method and mask pattern correcting device used for said method - Google Patents
Mask pattern correcting method and mask pattern correcting device used for said methodInfo
- Publication number
- JPS5456370A JPS5456370A JP12237777A JP12237777A JPS5456370A JP S5456370 A JPS5456370 A JP S5456370A JP 12237777 A JP12237777 A JP 12237777A JP 12237777 A JP12237777 A JP 12237777A JP S5456370 A JPS5456370 A JP S5456370A
- Authority
- JP
- Japan
- Prior art keywords
- defect
- patterns
- mask pattern
- unit patterns
- pattern correcting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007547 defect Effects 0.000 abstract 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 2
- 239000002131 composite material Substances 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To make possible correction of intricate defects by radiating laser beam, etc. to the unoverlapped and projected defect parts in the composite images of the defect pattern regions of a metal mask and the same pattern regions to be compared.
CONSTITUTION: Objective lenses 14, 15 are provided above a metal mask 10 which has patterns comprising longitudinally and transversely arrayed unit patterns composed of chrome layers on a glass plate. The lens 14 transmits the unit patterns having defects and the lens 15 transmits proximate normal unit patterns, as the accurately combined patterns to an observation system 18 after having been subjected to position adjustment by the optical system from a light source 20. Since the protruded defect regions 28 of the composite images are of half tone, they are recognized. A laser radiation region 29 is brought tangential to the normal pattern part by a slit 26 capable of creating a desired rectangle so as to completely cover the region 28, thence a shutter 27 is opened to radiate a laser beam 25, thereby romoving the chrome layer of the portion of the radiation region 29. Thereafter, other defect portions may be removed as well, by adjusting the positions
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12237777A JPS5456370A (en) | 1977-10-14 | 1977-10-14 | Mask pattern correcting method and mask pattern correcting device used for said method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12237777A JPS5456370A (en) | 1977-10-14 | 1977-10-14 | Mask pattern correcting method and mask pattern correcting device used for said method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5456370A true JPS5456370A (en) | 1979-05-07 |
Family
ID=14834319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12237777A Pending JPS5456370A (en) | 1977-10-14 | 1977-10-14 | Mask pattern correcting method and mask pattern correcting device used for said method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5456370A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56111227A (en) * | 1980-02-08 | 1981-09-02 | Hitachi Ltd | Laser working device with projection method using iris diaphragm |
| JPH0313946A (en) * | 1989-06-12 | 1991-01-22 | Dainippon Printing Co Ltd | Defect correcting device for emulsion mask or the like |
-
1977
- 1977-10-14 JP JP12237777A patent/JPS5456370A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56111227A (en) * | 1980-02-08 | 1981-09-02 | Hitachi Ltd | Laser working device with projection method using iris diaphragm |
| JPH0313946A (en) * | 1989-06-12 | 1991-01-22 | Dainippon Printing Co Ltd | Defect correcting device for emulsion mask or the like |
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