JPS5463295A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS5463295A JPS5463295A JP12948477A JP12948477A JPS5463295A JP S5463295 A JPS5463295 A JP S5463295A JP 12948477 A JP12948477 A JP 12948477A JP 12948477 A JP12948477 A JP 12948477A JP S5463295 A JPS5463295 A JP S5463295A
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- hfb
- base plate
- film
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 abstract 4
- 239000004020 conductor Substances 0.000 abstract 3
- 229910003862 HfB2 Inorganic materials 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000919 ceramic Substances 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 239000011241 protective layer Substances 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
Landscapes
- Electronic Switches (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Non-Adjustable Resistors (AREA)
- Conductive Materials (AREA)
Abstract
PURPOSE: To raise the oxidation resistance, the stability of resistance value, and resistivity value by forming HfB2 theremogenous reistor by electronic beam deposition or sputtering and then by covering it with a protective layer with an electric conductor.
CONSTITUTION: The surface of the base plate 1 of ceramic glass, grazed ceramics, etc., is covered with the HfB2 thermogenous resistor 2, the electric conductor 3 of Al, Au, etc., for power supply, and the protective layer 4 of SiO2, Ta2O5, Al2O3, MgO, etc., or a multilayer of these for protecting the resistor 2 and the conductor 3. The sputtering is made by electronic beam deposition or sputtering. The heating or the base plate being processed for forming the film at 200 to 500°C makes the adhesiveness of the film better, and also the heating of the base plate covered with the film at 200 to 650°C brings on regulated and stabilized resistance value. The sputtering is made in Ar gas of 10-3 to 5×10-1 Torr when the target used is HfB6 or Hf and B, but in a mixed gas of Ar and diborane when the target is Hf alone.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12948477A JPS5463295A (en) | 1977-10-28 | 1977-10-28 | Thermal head |
| US05/906,359 US4296309A (en) | 1977-05-19 | 1978-05-15 | Thermal head |
| DE19782821950 DE2821950A1 (en) | 1977-05-19 | 1978-05-19 | Head for thermal printing with stable resistance - obtd. by sputtering a metal boride resistance heating element onto a glazed substrate |
| US06/552,013 US4545881A (en) | 1977-05-19 | 1983-11-16 | Method for producing electro-thermal transducer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12948477A JPS5463295A (en) | 1977-10-28 | 1977-10-28 | Thermal head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5463295A true JPS5463295A (en) | 1979-05-22 |
| JPS5719843B2 JPS5719843B2 (en) | 1982-04-24 |
Family
ID=15010615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12948477A Granted JPS5463295A (en) | 1977-05-19 | 1977-10-28 | Thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5463295A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5465393A (en) * | 1977-11-01 | 1979-05-25 | Canon Inc | Thin film resistor |
| JPS5610470A (en) * | 1979-07-04 | 1981-02-02 | Canon Inc | Liquid drop jetting type recording device |
| JPS5610471A (en) * | 1979-07-04 | 1981-02-02 | Canon Inc | Liquid drop jetting type recording device |
| JPS5811169A (en) * | 1981-07-10 | 1983-01-21 | Canon Inc | Liquid-injection recording method |
-
1977
- 1977-10-28 JP JP12948477A patent/JPS5463295A/en active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5465393A (en) * | 1977-11-01 | 1979-05-25 | Canon Inc | Thin film resistor |
| JPS5610470A (en) * | 1979-07-04 | 1981-02-02 | Canon Inc | Liquid drop jetting type recording device |
| JPS5610471A (en) * | 1979-07-04 | 1981-02-02 | Canon Inc | Liquid drop jetting type recording device |
| JPS5811169A (en) * | 1981-07-10 | 1983-01-21 | Canon Inc | Liquid-injection recording method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5719843B2 (en) | 1982-04-24 |
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