JPS5464971A - Forming method for light absorbing film of color picture tube - Google Patents

Forming method for light absorbing film of color picture tube

Info

Publication number
JPS5464971A
JPS5464971A JP13171377A JP13171377A JPS5464971A JP S5464971 A JPS5464971 A JP S5464971A JP 13171377 A JP13171377 A JP 13171377A JP 13171377 A JP13171377 A JP 13171377A JP S5464971 A JPS5464971 A JP S5464971A
Authority
JP
Japan
Prior art keywords
film
exposure
time
shadow part
dmin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13171377A
Other languages
Japanese (ja)
Other versions
JPS6023459B2 (en
Inventor
Kazuaki Hirabayashi
Atsushi Kihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP13171377A priority Critical patent/JPS6023459B2/en
Publication of JPS5464971A publication Critical patent/JPS5464971A/en
Publication of JPS6023459B2 publication Critical patent/JPS6023459B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To form a light absorbing film which features a reduced diameter of the half-shadow part without changing diameter dmin of the real-shadow part by means of the negative and positive resist films. CONSTITUTION:Negative and positive photo resist 12 and 13 are laminated onto face panel 11, with the sensitive exposure volume 5 and 10 for film 13 and 12 respectively. Owing to existence of film 13, the exposure time is set to 1.5a to obtain the exposure volume (equivalent to dmin) of film 12. With this prolongation of the time, the sensitive time is increased at the falf-shadow part for film 13. The exposure volume of film 12 increases at time (a), and the area equivalent to 3.3 of the conventional area becomes the part where the exposure volume ''0'' with dmin decided. In this way, the light at the half-shadow part is consumed by film 13 for film 12 even with the piling irradiation of the light, thus deceasing the substantial irradiation area. Positive film 13 is removed later along with unsensed film 12, so no trouble occurs to the exposure of film 12 even though the entire surface is exposed.
JP13171377A 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube Expired JPS6023459B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13171377A JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13171377A JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Publications (2)

Publication Number Publication Date
JPS5464971A true JPS5464971A (en) 1979-05-25
JPS6023459B2 JPS6023459B2 (en) 1985-06-07

Family

ID=15064449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13171377A Expired JPS6023459B2 (en) 1977-11-02 1977-11-02 Method for forming light absorption film for color picture tube

Country Status (1)

Country Link
JP (1) JPS6023459B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110165A3 (en) * 1982-11-01 1987-01-07 General Electric Company A method of enhancing the contrast of images and materials therefor
US5108874A (en) * 1982-11-01 1992-04-28 Microsi, Inc. Composite useful in photolithography
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2258170C2 (en) * 2001-04-11 2005-08-10 Сумитомо Метал Индастриз, Лтд. Threaded connection for steel pipes

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0110165A3 (en) * 1982-11-01 1987-01-07 General Electric Company A method of enhancing the contrast of images and materials therefor
EP0355934A3 (en) * 1982-11-01 1990-11-28 Huls America Inc. Photobleachable compositions
US5108874A (en) * 1982-11-01 1992-04-28 Microsi, Inc. Composite useful in photolithography
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt

Also Published As

Publication number Publication date
JPS6023459B2 (en) 1985-06-07

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