JPS5471992A - Electron beam shaping aperture mask - Google Patents

Electron beam shaping aperture mask

Info

Publication number
JPS5471992A
JPS5471992A JP13871577A JP13871577A JPS5471992A JP S5471992 A JPS5471992 A JP S5471992A JP 13871577 A JP13871577 A JP 13871577A JP 13871577 A JP13871577 A JP 13871577A JP S5471992 A JPS5471992 A JP S5471992A
Authority
JP
Japan
Prior art keywords
electron beam
beam shaping
aperture mask
shaping aperture
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13871577A
Other languages
Japanese (ja)
Other versions
JPS5615572B2 (en
Inventor
Toshiaki Shinozaki
Kanji Wada
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP13871577A priority Critical patent/JPS5471992A/en
Publication of JPS5471992A publication Critical patent/JPS5471992A/en
Publication of JPS5615572B2 publication Critical patent/JPS5615572B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP13871577A 1977-11-18 1977-11-18 Electron beam shaping aperture mask Granted JPS5471992A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13871577A JPS5471992A (en) 1977-11-18 1977-11-18 Electron beam shaping aperture mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13871577A JPS5471992A (en) 1977-11-18 1977-11-18 Electron beam shaping aperture mask

Publications (2)

Publication Number Publication Date
JPS5471992A true JPS5471992A (en) 1979-06-08
JPS5615572B2 JPS5615572B2 (en) 1981-04-10

Family

ID=15228427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13871577A Granted JPS5471992A (en) 1977-11-18 1977-11-18 Electron beam shaping aperture mask

Country Status (1)

Country Link
JP (1) JPS5471992A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694739A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Electronic beam exposure method
WO1990011614A1 (en) * 1989-03-24 1990-10-04 Hitachi, Ltd. Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same
US5334845A (en) * 1989-03-24 1994-08-02 Hitachi Limited Charged beam exposure method and apparatus as well as aperture stop and production method thereof
JP2009048877A (en) * 2007-08-21 2009-03-05 Nec Electronics Corp Ion implanter
JP2013016308A (en) * 2011-07-01 2013-01-24 National Tsinghua Univ Phase plate and transmission electron microscope

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130679U (en) * 1976-03-31 1977-10-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130679U (en) * 1976-03-31 1977-10-04

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5694739A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Electronic beam exposure method
WO1990011614A1 (en) * 1989-03-24 1990-10-04 Hitachi, Ltd. Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same
US5334845A (en) * 1989-03-24 1994-08-02 Hitachi Limited Charged beam exposure method and apparatus as well as aperture stop and production method thereof
JP2009048877A (en) * 2007-08-21 2009-03-05 Nec Electronics Corp Ion implanter
JP2013016308A (en) * 2011-07-01 2013-01-24 National Tsinghua Univ Phase plate and transmission electron microscope

Also Published As

Publication number Publication date
JPS5615572B2 (en) 1981-04-10

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