JPS5511280A - One pair exposure image forming system and product useful therefor - Google Patents

One pair exposure image forming system and product useful therefor

Info

Publication number
JPS5511280A
JPS5511280A JP5794079A JP5794079A JPS5511280A JP S5511280 A JPS5511280 A JP S5511280A JP 5794079 A JP5794079 A JP 5794079A JP 5794079 A JP5794079 A JP 5794079A JP S5511280 A JPS5511280 A JP S5511280A
Authority
JP
Japan
Prior art keywords
image forming
forming system
exposure image
product useful
useful therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5794079A
Other languages
Japanese (ja)
Inventor
Kenichi Shimazu
Takao Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of JPS5511280A publication Critical patent/JPS5511280A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP5794079A 1978-05-11 1979-05-11 One pair exposure image forming system and product useful therefor Pending JPS5511280A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US90483978A 1978-05-11 1978-05-11

Publications (1)

Publication Number Publication Date
JPS5511280A true JPS5511280A (en) 1980-01-26

Family

ID=25419865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5794079A Pending JPS5511280A (en) 1978-05-11 1979-05-11 One pair exposure image forming system and product useful therefor

Country Status (3)

Country Link
JP (1) JPS5511280A (en)
DE (1) DE2919138A1 (en)
GB (1) GB2021276A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016538591A (en) * 2013-10-30 2016-12-08 ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー Substrate comprising electrical circuit pattern, method and system for providing the same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4458003A (en) * 1982-06-07 1984-07-03 Esselte Pendaflex Corp. Photosensitive materials for use in making dry transfers
DE3924812A1 (en) * 1989-07-27 1991-01-31 Hoechst Ag SOLVENT MIXTURE AND COATING SOLUTION FOR THE PRODUCTION OF NEGATIVE WORKING LIGHT-SENSITIVE RECORDING MATERIALS
GB9214304D0 (en) * 1992-07-06 1992-08-19 Du Pont Uk Improvements in or relating to image formation
EP0590205B1 (en) * 1992-09-30 1995-12-13 Agfa-Gevaert N.V. A heat mode recording material for making images or driographic printing plates
DE69218951T2 (en) * 1992-12-08 1997-11-06 Agfa Gevaert Nv Heat sensitive recording element
WO1996034767A1 (en) * 1995-05-01 1996-11-07 Polaroid Corporation Composite ablation-transfer imaging medium for printing plate production

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016538591A (en) * 2013-10-30 2016-12-08 ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー Substrate comprising electrical circuit pattern, method and system for providing the same
US10349525B2 (en) 2013-10-30 2019-07-09 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Substrate comprising an electrical circuit pattern, method and system for providing same

Also Published As

Publication number Publication date
GB2021276A (en) 1979-11-28
DE2919138A1 (en) 1979-11-15

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