JPS55115968A - Target for sputtering - Google Patents

Target for sputtering

Info

Publication number
JPS55115968A
JPS55115968A JP2397979A JP2397979A JPS55115968A JP S55115968 A JPS55115968 A JP S55115968A JP 2397979 A JP2397979 A JP 2397979A JP 2397979 A JP2397979 A JP 2397979A JP S55115968 A JPS55115968 A JP S55115968A
Authority
JP
Japan
Prior art keywords
target
targets
insulating layer
heat
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2397979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6344817B2 (cs
Inventor
Koji Nishiyama
Suehiro Kato
Takeshi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP2397979A priority Critical patent/JPS55115968A/ja
Publication of JPS55115968A publication Critical patent/JPS55115968A/ja
Publication of JPS6344817B2 publication Critical patent/JPS6344817B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2397979A 1979-02-28 1979-02-28 Target for sputtering Granted JPS55115968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2397979A JPS55115968A (en) 1979-02-28 1979-02-28 Target for sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2397979A JPS55115968A (en) 1979-02-28 1979-02-28 Target for sputtering

Publications (2)

Publication Number Publication Date
JPS55115968A true JPS55115968A (en) 1980-09-06
JPS6344817B2 JPS6344817B2 (cs) 1988-09-07

Family

ID=12125668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2397979A Granted JPS55115968A (en) 1979-02-28 1979-02-28 Target for sputtering

Country Status (1)

Country Link
JP (1) JPS55115968A (cs)

Also Published As

Publication number Publication date
JPS6344817B2 (cs) 1988-09-07

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