JPS55118911A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS55118911A
JPS55118911A JP2591679A JP2591679A JPS55118911A JP S55118911 A JPS55118911 A JP S55118911A JP 2591679 A JP2591679 A JP 2591679A JP 2591679 A JP2591679 A JP 2591679A JP S55118911 A JPS55118911 A JP S55118911A
Authority
JP
Japan
Prior art keywords
polymer
group
resin composition
photosensitive resin
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2591679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5728488B2 (2
Inventor
Shoji Watanabe
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP2591679A priority Critical patent/JPS55118911A/ja
Publication of JPS55118911A publication Critical patent/JPS55118911A/ja
Publication of JPS5728488B2 publication Critical patent/JPS5728488B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2591679A 1979-03-06 1979-03-06 Photosensitive resin composition Granted JPS55118911A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2591679A JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2591679A JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS55118911A true JPS55118911A (en) 1980-09-12
JPS5728488B2 JPS5728488B2 (2) 1982-06-17

Family

ID=12179094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2591679A Granted JPS55118911A (en) 1979-03-06 1979-03-06 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55118911A (2)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294484A (en) * 1991-08-03 1994-03-15 Sony Corporation Polyvinyl aromatic carboxylic acid ester and video printing paper
JPH0741515A (ja) * 1993-05-20 1995-02-10 Gold Star Co Ltd 液晶整列のための熱安定性光重合物質
KR100481014B1 (ko) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 포토폴리머를 이용한 감광성 수지 조성물
KR101015112B1 (ko) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 밀착력과 텐팅성이 향상된 감광성 수지조성물
JP2012144610A (ja) * 2011-01-11 2012-08-02 Kansai Univ 光応答性高分子、当該光応答性高分子が形成されてなる成形物およびその利用

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5294484A (en) * 1991-08-03 1994-03-15 Sony Corporation Polyvinyl aromatic carboxylic acid ester and video printing paper
JPH0741515A (ja) * 1993-05-20 1995-02-10 Gold Star Co Ltd 液晶整列のための熱安定性光重合物質
KR100481014B1 (ko) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 포토폴리머를 이용한 감광성 수지 조성물
KR101015112B1 (ko) 2004-07-12 2011-02-16 코오롱인더스트리 주식회사 밀착력과 텐팅성이 향상된 감광성 수지조성물
JP2012144610A (ja) * 2011-01-11 2012-08-02 Kansai Univ 光応答性高分子、当該光応答性高分子が形成されてなる成形物およびその利用

Also Published As

Publication number Publication date
JPS5728488B2 (2) 1982-06-17

Similar Documents

Publication Publication Date Title
JPS56141321A (en) Photosetting resin composition
JPS5695902A (en) Uv-curable resin composition
SG18493G (en) Polyamides with hexafluoroisopropylidene groups,positively acting photosensitive compositions and recording materials using them
ES8300802A1 (es) Un procedimiento para la fabricacion de imagenes en relieve.
KR890009793A (ko) 열경화성 이오노모(Ionomer) 시멘트계
JPS5610529A (en) Curable resin composition
JPS57204032A (en) Photosensitive material
JPS5555335A (en) Photosensitive composition
JPS5710605A (en) Photopolymerizable composition
JPS55118911A (en) Photosensitive resin composition
KR890017278A (ko) 광개시제 공중합체
ATE81911T1 (de) Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen.
JPS56145922A (en) Material for curable resin
JPS55118917A (en) Production of quinazolone ring-containing epoxy resin
JPS55104264A (en) Bezyl ketal derivative
JPS5742724A (en) Curable composition
KR920020270A (ko) 포지티브-작용성 감방사선성 혼합물 및 이 혼합물을 사용하여 제조된 감방사선성 기록물질
JPS57192461A (en) Photosensitive resin composition
JPS5649756A (en) Modifier for moldable resin
KR910000964A (ko) 잠열형 양 이온 중합 개시제 및 이것을 함유하는 수지합성물
JPS55717A (en) Photo-setting resin composition
JPS5749646A (en) Epoxy resin composition
JPS5682802A (en) Ultraviolet-curing coating composition
JPS5728129A (en) Curing agent for epoxy resin
JPS5669628A (en) Developer composition for lithographic plate