JPS55140230A - Pattern-correcting device - Google Patents

Pattern-correcting device

Info

Publication number
JPS55140230A
JPS55140230A JP4796179A JP4796179A JPS55140230A JP S55140230 A JPS55140230 A JP S55140230A JP 4796179 A JP4796179 A JP 4796179A JP 4796179 A JP4796179 A JP 4796179A JP S55140230 A JPS55140230 A JP S55140230A
Authority
JP
Japan
Prior art keywords
light source
gate
substrate
pattern
illuminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4796179A
Other languages
Japanese (ja)
Inventor
Yasuhiro Koizumi
Morihisa Hoko
Susumu Kano
Takao Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4796179A priority Critical patent/JPS55140230A/en
Publication of JPS55140230A publication Critical patent/JPS55140230A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To identify and correct minute defects and foreign objects highly efficiently, by emitting the light which is directed to a substrate on which a pattern is formed, and utilizing the signal obtained by sensing the light reflected from the illuminated portion. CONSTITUTION:A light source 4 emits a low-power beam 3 from the side of a Cr film, against the photomask on a substrate 1 on which a pattern 2 comprising a Cr film is formed. A light source 6 is arranged to emit a correcting laser beam 5 to the same position illuminated by the beam 3 at the back side of the substrate 1. Photosensors 7 are arranged at the vicinity of the beam 3 so that they are directed toward the illuminated portion. The outputs of the photosensors 7 control 8 the operation of the light source 6 for the correcting laser. If the beam 3 illuminates a defect 9, the output of an OR gate OG is a zero. If a foreign object 10 is illuminated, scattered lights enter the photosensor 7, and the output of the gate OG becomes a 1. Thus, the defects and foreign objects can be identified, the light source 6 is operated depending on the output of the OR gate, thereby the defects are automatically corrected and the number of the foreign objects can be counted.
JP4796179A 1979-04-20 1979-04-20 Pattern-correcting device Pending JPS55140230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4796179A JPS55140230A (en) 1979-04-20 1979-04-20 Pattern-correcting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4796179A JPS55140230A (en) 1979-04-20 1979-04-20 Pattern-correcting device

Publications (1)

Publication Number Publication Date
JPS55140230A true JPS55140230A (en) 1980-11-01

Family

ID=12789930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4796179A Pending JPS55140230A (en) 1979-04-20 1979-04-20 Pattern-correcting device

Country Status (1)

Country Link
JP (1) JPS55140230A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6436379U (en) * 1987-08-25 1989-03-06

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5091279A (en) * 1973-12-12 1975-07-21
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5091279A (en) * 1973-12-12 1975-07-21
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6436379U (en) * 1987-08-25 1989-03-06

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