JPS5514087B2 - - Google Patents

Info

Publication number
JPS5514087B2
JPS5514087B2 JP9928973A JP9928973A JPS5514087B2 JP S5514087 B2 JPS5514087 B2 JP S5514087B2 JP 9928973 A JP9928973 A JP 9928973A JP 9928973 A JP9928973 A JP 9928973A JP S5514087 B2 JPS5514087 B2 JP S5514087B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9928973A
Other languages
Japanese (ja)
Other versions
JPS5050106A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9928973A priority Critical patent/JPS5514087B2/ja
Priority to FR7430950A priority patent/FR2242702A1/fr
Priority to GB3873374A priority patent/GB1489425A/en
Priority to DE19742442527 priority patent/DE2442527C3/en
Publication of JPS5050106A publication Critical patent/JPS5050106A/ja
Publication of JPS5514087B2 publication Critical patent/JPS5514087B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
JP9928973A 1973-09-05 1973-09-05 Expired JPS5514087B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (en) 1973-09-05 1973-09-05
FR7430950A FR2242702A1 (en) 1973-09-05 1974-09-04
GB3873374A GB1489425A (en) 1973-09-05 1974-09-04 Photo-curable resin compositions
DE19742442527 DE2442527C3 (en) 1973-09-05 1974-09-05 Photo-curable resin composition based on a modified epoxy resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9928973A JPS5514087B2 (en) 1973-09-05 1973-09-05

Publications (2)

Publication Number Publication Date
JPS5050106A JPS5050106A (en) 1975-05-06
JPS5514087B2 true JPS5514087B2 (en) 1980-04-14

Family

ID=14243473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9928973A Expired JPS5514087B2 (en) 1973-09-05 1973-09-05

Country Status (4)

Country Link
JP (1) JPS5514087B2 (en)
DE (1) DE2442527C3 (en)
FR (1) FR2242702A1 (en)
GB (1) GB1489425A (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
EP0091401B1 (en) * 1982-04-03 1986-11-20 Ciba-Geigy Ag Process for preparing prepregs from fibres that contain cellulose using aqueous resin compositions
US4393181A (en) 1982-06-30 1983-07-12 Shell Oil Company Polyfunctional phenolic-melamine epoxy resin curing agents
DE3447355A1 (en) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen CROSSLINKABLE RESIN, LIGHT SENSITIVE RECORDING MATERIAL BASED ON THIS CROSSLINKABLE RESIN AND METHOD FOR PRODUCING A FLAT PRINTING PLATE BY MEANS OF THIS LIGHT SENSITIVE RECORDING MATERIAL
DE3447357A1 (en) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen DRY FILM RESIST AND METHOD FOR PRODUCING RESIST PATTERNS
JPS61243869A (en) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk Resist ink composition
DE3619129A1 (en) * 1986-06-06 1987-12-10 Basf Ag LIGHT SENSITIVE RECORDING ELEMENT
JPS63186232A (en) * 1987-01-28 1988-08-01 Toyobo Co Ltd Photosensitive resin composition
DE3717036A1 (en) * 1987-05-21 1988-12-08 Basf Ag PHOTOPOLYMERIZABLE RECORDING MATERIALS, PHOTORESIS LAYERS AND FLAT PRINTING PLATES BASED ON THESE RECORDING MATERIALS
EP0292219A3 (en) * 1987-05-21 1989-10-11 AT&T Corp. Printed circuit board fabrication
DE3717034A1 (en) * 1987-05-21 1988-12-08 Basf Ag PHOTOPOLYMERIZABLE RECORDING MATERIALS, AND PHOTORESIS LAYERS AND FLAT PRINTING PLATES BASED ON THESE RECORDING MATERIALS, AND NEW CHINAZOLONE-4 COMPOUNDS
DE3717037A1 (en) * 1987-05-21 1988-12-08 Basf Ag PHOTOPOLYMERIZABLE RECORDING MATERIALS, PHOTORESIS LAYERS AND FLAT PRINTING PLATES BASED ON THESE RECORDING MATERIALS
DE3717038A1 (en) * 1987-05-21 1988-12-08 Basf Ag PHOTOPOLYMERIZABLE RECORDING MATERIALS, PHOTORESIS LAYERS AND FLAT PRINTING PLATES BASED ON THESE RECORDING MATERIALS
GB8804044D0 (en) * 1988-02-22 1988-03-23 Coates Brothers Plc Coating compositions
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
CN1182485A (en) * 1995-04-27 1998-05-20 美国3M公司 Negative type unprocessed plate
US5910395A (en) 1995-04-27 1999-06-08 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
CN113583222B (en) * 2021-08-24 2023-03-24 濮阳市盛源能源科技股份有限公司 Block copolymerization type degradable polyester and preparation method thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5640329B2 (en) * 1972-04-24 1981-09-19

Also Published As

Publication number Publication date
DE2442527B2 (en) 1976-08-12
DE2442527C3 (en) 1980-04-10
JPS5050106A (en) 1975-05-06
GB1489425A (en) 1977-10-19
DE2442527A1 (en) 1975-04-03
FR2242702A1 (en) 1975-03-28

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