JPS55145351A - Electrostatic chuck - Google Patents

Electrostatic chuck

Info

Publication number
JPS55145351A
JPS55145351A JP5438780A JP5438780A JPS55145351A JP S55145351 A JPS55145351 A JP S55145351A JP 5438780 A JP5438780 A JP 5438780A JP 5438780 A JP5438780 A JP 5438780A JP S55145351 A JPS55145351 A JP S55145351A
Authority
JP
Japan
Prior art keywords
electrostatic chuck
chuck
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5438780A
Other languages
English (en)
Japanese (ja)
Inventor
Baagunaa Uute
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
VEB Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VEB Carl Zeiss Jena GmbH filed Critical VEB Carl Zeiss Jena GmbH
Publication of JPS55145351A publication Critical patent/JPS55145351A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Landscapes

  • Jigs For Machine Tools (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
JP5438780A 1979-04-26 1980-04-25 Electrostatic chuck Pending JPS55145351A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD79212511A DD143131A1 (de) 1979-04-26 1979-04-26 Vorrichtung zum elektrostatischen halten von werkstuecken,insbesondere halbleiterscheiben

Publications (1)

Publication Number Publication Date
JPS55145351A true JPS55145351A (en) 1980-11-12

Family

ID=5517859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5438780A Pending JPS55145351A (en) 1979-04-26 1980-04-25 Electrostatic chuck

Country Status (5)

Country Link
JP (1) JPS55145351A (de)
DD (1) DD143131A1 (de)
DE (1) DE3013352A1 (de)
FR (1) FR2455360A1 (de)
GB (1) GB2050064A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928354A (ja) * 1982-08-10 1984-02-15 Toshiba Corp 静電チヤツク用薄膜
JPH08203800A (ja) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd 試料ホルダの固定装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2106325A (en) * 1981-09-14 1983-04-07 Philips Electronic Associated Electrostatic chuck
JPS6059104B2 (ja) * 1982-02-03 1985-12-23 株式会社東芝 静電チヤツク板
US4551192A (en) * 1983-06-30 1985-11-05 International Business Machines Corporation Electrostatic or vacuum pinchuck formed with microcircuit lithography
GB2147459A (en) * 1983-09-30 1985-05-09 Philips Electronic Associated Electrostatic chuck for semiconductor wafers
EP0138254B1 (de) * 1983-09-30 1988-06-01 Philips Electronics Uk Limited Elektrostatische Haltevorrichtung und Verfahren zum Beschicken
JPS6099538A (ja) * 1983-11-01 1985-06-03 横河・ヒュ−レット・パッカ−ド株式会社 ピンチヤツク
JPS61161713A (ja) * 1985-01-10 1986-07-22 Sumitomo Electric Ind Ltd 半導体製造用部品
AT383439B (de) * 1985-11-04 1987-07-10 Akad Wissenschaften Ddr Vorrichtung fuer beschickungseinrichtungen von trockenaetzanlagen
US5325261A (en) * 1991-05-17 1994-06-28 Unisearch Limited Electrostatic chuck with improved release
US5315473A (en) * 1992-01-21 1994-05-24 Applied Materials, Inc. Isolated electrostatic chuck and excitation method
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
EP0635870A1 (de) * 1993-07-20 1995-01-25 Applied Materials, Inc. Eine elektrostatische Halteplatte mit einer gerillten Fläche
US5535507A (en) * 1993-12-20 1996-07-16 International Business Machines Corporation Method of making electrostatic chuck with oxide insulator
US5656093A (en) * 1996-03-08 1997-08-12 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
US5745332A (en) * 1996-05-08 1998-04-28 Applied Materials, Inc. Monopolar electrostatic chuck having an electrode in contact with a workpiece

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928354A (ja) * 1982-08-10 1984-02-15 Toshiba Corp 静電チヤツク用薄膜
JPH08203800A (ja) * 1995-01-23 1996-08-09 Toshiba Mach Co Ltd 試料ホルダの固定装置

Also Published As

Publication number Publication date
DE3013352A1 (de) 1980-11-13
FR2455360A1 (fr) 1980-11-21
GB2050064A (en) 1980-12-31
DD143131A1 (de) 1980-07-30

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