JPS55155348A - Photosensitive image forming material - Google Patents
Photosensitive image forming materialInfo
- Publication number
- JPS55155348A JPS55155348A JP6293479A JP6293479A JPS55155348A JP S55155348 A JPS55155348 A JP S55155348A JP 6293479 A JP6293479 A JP 6293479A JP 6293479 A JP6293479 A JP 6293479A JP S55155348 A JPS55155348 A JP S55155348A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- org
- image forming
- forming material
- cellulose ester
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 4
- 239000004952 Polyamide Substances 0.000 abstract 3
- 229920002678 cellulose Polymers 0.000 abstract 3
- 229920002647 polyamide Polymers 0.000 abstract 3
- -1 azide compound Chemical class 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000001299 aldehydes Chemical class 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 150000008049 diazo compounds Chemical class 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000012046 mixed solvent Substances 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To enhance the etchability and peelability of a photosensitive image forming material by covering a support with a layer consisting of N-alkoxyalkylated polyamide and cellulose ester as an org. covering layer and forming a photosensitive photoresist layer on the org. layer.
CONSTITUTION: A support is covered with an org. covering layer of a mixture of cellulose ester and N-alkoxyalkylated polyamide having alkoxydialkylation degree of about 10W40% and obtd. by heat reacting polyamide in a mixed solvent of alcohol and aldehydes in the presence of catalyst. The mixing ratio of the cellulose ester depends upon the kind of the ester. On the layer a photosensitive photoresist composition layer consisting mainly of an azide compound, and o-quinone azide compound and a diazo compound is formed to manufacture a photosensitive image forming material. The etchability and peelability of the org. layer disclosed after exposure and development are enhanced, and this material is suitable for use in manufacture of a process master for a photomechanical process.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6293479A JPS55155348A (en) | 1979-05-21 | 1979-05-21 | Photosensitive image forming material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6293479A JPS55155348A (en) | 1979-05-21 | 1979-05-21 | Photosensitive image forming material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55155348A true JPS55155348A (en) | 1980-12-03 |
| JPS6316728B2 JPS6316728B2 (en) | 1988-04-11 |
Family
ID=13214608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6293479A Granted JPS55155348A (en) | 1979-05-21 | 1979-05-21 | Photosensitive image forming material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55155348A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04284600A (en) * | 1991-03-14 | 1992-10-09 | Yokogawa Electric Corp | Signal transmitter |
-
1979
- 1979-05-21 JP JP6293479A patent/JPS55155348A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316728B2 (en) | 1988-04-11 |
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