JPS5516059A - Manufacturing of plastic molded article free from bleeding of additive - Google Patents

Manufacturing of plastic molded article free from bleeding of additive

Info

Publication number
JPS5516059A
JPS5516059A JP8961578A JP8961578A JPS5516059A JP S5516059 A JPS5516059 A JP S5516059A JP 8961578 A JP8961578 A JP 8961578A JP 8961578 A JP8961578 A JP 8961578A JP S5516059 A JPS5516059 A JP S5516059A
Authority
JP
Japan
Prior art keywords
molded article
ion beam
plastic molded
bleeding
additive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8961578A
Other languages
Japanese (ja)
Other versions
JPS571544B2 (en
Inventor
Koichi Kanetani
Kiichi Hojo
Kunihiko Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Achilles Corp
Original Assignee
Achilles Corp
Kohkoku Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Achilles Corp, Kohkoku Chemical Industry Co Ltd filed Critical Achilles Corp
Priority to JP8961578A priority Critical patent/JPS5516059A/en
Publication of JPS5516059A publication Critical patent/JPS5516059A/en
Publication of JPS571544B2 publication Critical patent/JPS571544B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE: To prevent the bleeding of additives of a plastic molded article, by bombarding a target with ion beam emitted from an ion source of an inorganic gas under high vacuum, and depositing the ejected atoms to the surface of the molded article to form a dense film.
CONSTITUTION: Inorganic gas 3 such as argon gas, nitrogen gas, etc. is introduced through an inlet 2 into an ion gun 1, and ionized by the electric discharge between the filament 4 and a counter-electrode. Ions are selectively extracted from the plasuma 5 by a negatively charged extraction electrode 6 to obtain an ion beam 7. The ion beam 7 is focused by focusing lenses 8 consisting of three electrostatic lenses. A target 10 made of carbon, silicon, etc. mounted in a vacuum chamber 9, is bombarded with the focused ion beam, and emits the atoms 11, which form a dense film on the surface of a plastic molded article 12.
COPYRIGHT: (C)1980,JPO&Japio
JP8961578A 1978-07-21 1978-07-21 Manufacturing of plastic molded article free from bleeding of additive Granted JPS5516059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8961578A JPS5516059A (en) 1978-07-21 1978-07-21 Manufacturing of plastic molded article free from bleeding of additive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8961578A JPS5516059A (en) 1978-07-21 1978-07-21 Manufacturing of plastic molded article free from bleeding of additive

Publications (2)

Publication Number Publication Date
JPS5516059A true JPS5516059A (en) 1980-02-04
JPS571544B2 JPS571544B2 (en) 1982-01-12

Family

ID=13975645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8961578A Granted JPS5516059A (en) 1978-07-21 1978-07-21 Manufacturing of plastic molded article free from bleeding of additive

Country Status (1)

Country Link
JP (1) JPS5516059A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58224745A (en) * 1982-06-23 1983-12-27 三菱化成ポリテック株式会社 Bag-shaped container for storing office supplies

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58224745A (en) * 1982-06-23 1983-12-27 三菱化成ポリテック株式会社 Bag-shaped container for storing office supplies

Also Published As

Publication number Publication date
JPS571544B2 (en) 1982-01-12

Similar Documents

Publication Publication Date Title
US3472751A (en) Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam
JPS5620163A (en) Beryllium oxide film and its formation
ES2076703T3 (en) PROCEDURE FOR TREATING, FOR EXAMPLE, THE SURFACE OF A SUBSTRATE THROUGH PROJECTION OF A PLASMA FLOW, AND DEVICE OF IMPLEMENTATION OF THE SAME.
SE8700017L (en) JONPLASMAELEKTROKANON
GB881458A (en) Method for heating materials by electron bombardment in a vacuum
EP0531949A2 (en) Fast atom beam source
SE8801145L (en) ION PLASMA ELECTRON CANNON WITH DOSRATE CONTROL DEVICE BY AMPLIT MODULATION OF THE PLASMA DISCHARGE
US4471224A (en) Apparatus and method for generating high current negative ions
JPS6473069A (en) Production of aluminum nitride film
JPS5367099A (en) Electron beam shape accelerator
JPS5516059A (en) Manufacturing of plastic molded article free from bleeding of additive
US20090020415A1 (en) "Iontron" ion beam deposition source and a method for sputter deposition of different layers using this source
JPS54124879A (en) Ion beam deposition
GB1153363A (en) Method of Coating.
JPS6465092A (en) Formation of thin diamond film
JPS6439371A (en) Thin film forming device
JPS55134767A (en) Electronic impulse type ion engine
JPS6453422A (en) Dry etching device
JPS5668932A (en) Manufacture of magnetic recording medium
SU702726A1 (en) Coating apparatus
JPS55165288A (en) Smooth finishing method of groove inside surface in metal mold or the like
JPS57208127A (en) Manufacture of semiconductor
JPS5579870A (en) Evaporation apparatus for substance in vacuum
JPS57160909A (en) Formation of thin amorphous silicon hydride film
JPH0445264A (en) Thin film forming device