JPS55162004A - Electric charge corpuscular ray irradiation unit - Google Patents

Electric charge corpuscular ray irradiation unit

Info

Publication number
JPS55162004A
JPS55162004A JP6984879A JP6984879A JPS55162004A JP S55162004 A JPS55162004 A JP S55162004A JP 6984879 A JP6984879 A JP 6984879A JP 6984879 A JP6984879 A JP 6984879A JP S55162004 A JPS55162004 A JP S55162004A
Authority
JP
Japan
Prior art keywords
reflector
electric charge
irradiation unit
ray irradiation
charge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6984879A
Other languages
Japanese (ja)
Inventor
Yoshinori Yoshida
Toru Tojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6984879A priority Critical patent/JPS55162004A/en
Publication of JPS55162004A publication Critical patent/JPS55162004A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To secure the more assured effect of the earth function by giving the direct connection between the reflector and the travelling object via the highly conductive component.
CONSTITUTION: Travelling object 1 which gives the movement to the object to receive irradiation of the charge corpuscular rays is provided movably on earthed substrate 3. And laser reflector 2 is attached to the end face in the direction of the mobile axis of object 1, and highly conductive component 4 is fixed to object 1 via screw 5 and at the position where the direct contact is secured to reflector 2. In such way, the chargeup or the local discharge can be prevented, thus avoiding the evil effects given to the charge corpuscle or the surface of the laser reflector.
COPYRIGHT: (C)1980,JPO&Japio
JP6984879A 1979-06-06 1979-06-06 Electric charge corpuscular ray irradiation unit Pending JPS55162004A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6984879A JPS55162004A (en) 1979-06-06 1979-06-06 Electric charge corpuscular ray irradiation unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6984879A JPS55162004A (en) 1979-06-06 1979-06-06 Electric charge corpuscular ray irradiation unit

Publications (1)

Publication Number Publication Date
JPS55162004A true JPS55162004A (en) 1980-12-17

Family

ID=13414630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6984879A Pending JPS55162004A (en) 1979-06-06 1979-06-06 Electric charge corpuscular ray irradiation unit

Country Status (1)

Country Link
JP (1) JPS55162004A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0365604A (en) * 1989-08-03 1991-03-20 Fuji Electric Co Ltd Optical sensor device
JP2000040485A (en) * 1991-05-30 2000-02-08 Kla Instr Corp Electronic beam inspection method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52135681A (en) * 1976-05-10 1977-11-12 Toshiba Corp Electron beam exposure apparatus
JPS5443681A (en) * 1977-09-13 1979-04-06 Mitsubishi Electric Corp Electron beam light-exposing method
JPS5464477A (en) * 1977-10-11 1979-05-24 Zasio John J Method of and device for forming electric connection from semiconductor wafer to conductive region

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52135681A (en) * 1976-05-10 1977-11-12 Toshiba Corp Electron beam exposure apparatus
JPS5443681A (en) * 1977-09-13 1979-04-06 Mitsubishi Electric Corp Electron beam light-exposing method
JPS5464477A (en) * 1977-10-11 1979-05-24 Zasio John J Method of and device for forming electric connection from semiconductor wafer to conductive region

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0365604A (en) * 1989-08-03 1991-03-20 Fuji Electric Co Ltd Optical sensor device
JP2000040485A (en) * 1991-05-30 2000-02-08 Kla Instr Corp Electronic beam inspection method

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