JPS5516475A - Plasma processing unit - Google Patents

Plasma processing unit

Info

Publication number
JPS5516475A
JPS5516475A JP8961778A JP8961778A JPS5516475A JP S5516475 A JPS5516475 A JP S5516475A JP 8961778 A JP8961778 A JP 8961778A JP 8961778 A JP8961778 A JP 8961778A JP S5516475 A JPS5516475 A JP S5516475A
Authority
JP
Japan
Prior art keywords
chamber
conductance
valve
exhaust pipes
processing unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8961778A
Other languages
Japanese (ja)
Inventor
Hiroshi Koshimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8961778A priority Critical patent/JPS5516475A/en
Publication of JPS5516475A publication Critical patent/JPS5516475A/en
Pending legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To keep dusts, if any in a chamber, from dispersing by connecting exhaust pipes of more than one at least which are variant in conductance to the chamber.
CONSTITUTION: In case a chamber 2 is decompressed inside through vacuumizing from the atmospheric pressure by operation of an air exhausting filter 5, deairing is carried out through a small-diametral exhaust pipe 4 with small conductance by opening a valve 7 at first, the valve 7 is closed then, and deairing is further carried out to a given degree of vacuum through a large-diametral exhaust pipe 3 with large conductance by opening a valve 6. In case there are arranged exhaust pipes of more than two which are variant in conductance, the chamber 2 is deaired to a given degree of vaccum by changing the exhaust pipes by turn similarly.
COPYRIGHT: (C)1980,JPO&Japio
JP8961778A 1978-07-21 1978-07-21 Plasma processing unit Pending JPS5516475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8961778A JPS5516475A (en) 1978-07-21 1978-07-21 Plasma processing unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8961778A JPS5516475A (en) 1978-07-21 1978-07-21 Plasma processing unit

Publications (1)

Publication Number Publication Date
JPS5516475A true JPS5516475A (en) 1980-02-05

Family

ID=13975702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8961778A Pending JPS5516475A (en) 1978-07-21 1978-07-21 Plasma processing unit

Country Status (1)

Country Link
JP (1) JPS5516475A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117629A (en) * 1983-11-30 1985-06-25 Hitachi Ltd Vacuum processing device
JPS60227421A (en) * 1985-04-05 1985-11-12 Hitachi Ltd Vacuum vessel
US20110124200A1 (en) * 2008-07-15 2011-05-26 Canon Anelva Corporation Method and apparatus of plasma treatment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4329256Y1 (en) * 1965-08-20 1968-12-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4329256Y1 (en) * 1965-08-20 1968-12-02

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117629A (en) * 1983-11-30 1985-06-25 Hitachi Ltd Vacuum processing device
JPS60227421A (en) * 1985-04-05 1985-11-12 Hitachi Ltd Vacuum vessel
US20110124200A1 (en) * 2008-07-15 2011-05-26 Canon Anelva Corporation Method and apparatus of plasma treatment
US8298627B2 (en) * 2008-07-15 2012-10-30 Canon Anelva Corporation Method and apparatus of plasma treatment

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