JPS5526576A - Lithographic printing material not requiring wetting water - Google Patents
Lithographic printing material not requiring wetting waterInfo
- Publication number
- JPS5526576A JPS5526576A JP10021878A JP10021878A JPS5526576A JP S5526576 A JPS5526576 A JP S5526576A JP 10021878 A JP10021878 A JP 10021878A JP 10021878 A JP10021878 A JP 10021878A JP S5526576 A JPS5526576 A JP S5526576A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- silicone rubber
- rubber layer
- wetting water
- vinyl groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 2
- 238000009736 wetting Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 title 1
- -1 polysiloxane Polymers 0.000 abstract 5
- 239000004743 Polypropylene Substances 0.000 abstract 3
- 229920001155 polypropylene Polymers 0.000 abstract 3
- 229920002379 silicone rubber Polymers 0.000 abstract 3
- 239000004945 silicone rubber Substances 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229920001296 polysiloxane Polymers 0.000 abstract 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 2
- 239000003431 cross linking reagent Substances 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To obtain the printing plate which is of good friction resistance and ink repellency and superior printing resistance by containing the organic polysiloxane having vinyl groups and bisazide compound in silicone rubber layer. CONSTITUTION:A photosensitive layer of 0.5 to 10mu is provided on a film such as of polypropylene or the like. The mixture comprising adding crosslinking agents, sentizers (1-nitropylene, etc.) to 0 to 95wt% of silicone rubber of several thousands to several hundred thousands in molecular weight based on the weight of the entire component of the rubber layer, 2 to 95% of organic polysiloxane having vinyl groups and 0.1 to 30wt% of bisazide compound is coated and dried by way of primer on the separately chemically formed Al plate, whereby the silicone rubber layer of 0.5 to 100mu is formed. Next, the foregoing polypropylene film and Al plate are affixed together. After the exposure, the polypropylene film is separated and is then developed, whereby the original lithographic plate not requiring wetting water is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10021878A JPS6042467B2 (en) | 1978-08-17 | 1978-08-17 | Lithographic printing material that does not require dampening water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10021878A JPS6042467B2 (en) | 1978-08-17 | 1978-08-17 | Lithographic printing material that does not require dampening water |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5526576A true JPS5526576A (en) | 1980-02-26 |
| JPS6042467B2 JPS6042467B2 (en) | 1985-09-21 |
Family
ID=14268152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10021878A Expired JPS6042467B2 (en) | 1978-08-17 | 1978-08-17 | Lithographic printing material that does not require dampening water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6042467B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55124149A (en) * | 1979-03-16 | 1980-09-25 | Toray Ind Inc | Photosensitive plate material for waterless lithographic printing |
-
1978
- 1978-08-17 JP JP10021878A patent/JPS6042467B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55124149A (en) * | 1979-03-16 | 1980-09-25 | Toray Ind Inc | Photosensitive plate material for waterless lithographic printing |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6042467B2 (en) | 1985-09-21 |
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